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研究生: 林于舜
Lin, Yu-Shun
論文名稱: 面內面外整合式電子光斑量測系統及其影像處理法研究
Research on A Combined In-Plane/Out-of-Plane Integrated ESPI System and Image Process Techniques
指導教授: 江國寧
Chiang, Kuo-Ning
口試委員: 鄭仙志
Zheng, Xian-Zhi
李昌駿
Lee, Chang-Chun
學位類別: 碩士
Master
系所名稱: 工學院 - 動力機械工程學系
Department of Power Mechanical Engineering
論文出版年: 2012
畢業學年度: 100
語文別: 中文
論文頁數: 69
中文關鍵詞: 電子光斑相平移法相位重建
外文關鍵詞: Electronic speckle pattern interferometry (ESPI), Phase Shifting, Phase Unwrapping
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  • 目前精密元件量測多以非接觸的量測方式為主。隨著製造技術的精進,許多基礎元件的尺寸縮小至微米等級,同時其量測的技術受到考驗。本研究提出一改進原始電子光斑(Electronic Speckle Pattern Interferometry)影像干涉量測之光路系統,將面內、面外電子光斑量測之光路整合且導入相平移法(Phase-Shifting)作為干涉條紋相位提取及增進相位分布(Wrapped Phase)品質之工具。此光路設計在改變不同量測維度僅需更動少許反射鏡的位置來切換面內、面外量測光路,藉此提升本二維變形量量測工具的便捷性。
    為了驗證此光路設計之可行及準確性,本研究利用量測一矽晶圓塗布Polyimide在因為加熱產生翹曲的面內、面外變形情況。並以有限元素法軟體ANSYS建立試片有限元素模型,成功的比對實驗與數值模擬結果。
    在原始相關條紋的影像透過相平移法後仍存在許多非連續之斑點,本研究引入快速傅立葉轉換並搭配高斯濾鏡之影像平滑法,嘗試減少雜訊的影響。最後為了得到連續之位移量分布,使用影像品質引導項為重建演算法(Quality Guided Phase Unwrapping)將原始相位分布展開維連續相位分布。透過位移與相位之線性關係得到全場之面內、面外位移量分布圖。
    本研究提出之整合二維電子光斑量測光路設計所量測到的位移量比對模擬結果,誤差皆在10%以內,證明本研究提出之整合式電子光斑光路設計的可行性與精確度。


    致 謝 摘 要 Abstract 第一章 緒論 1-1研究動機與方向 1-2 文獻回顧 1-2-1 電子光斑干涉發展 1-2-2 影像後處理技術發展 1-3 研究目標 第二章 基礎理論 2-1電子光斑量測原理 2-1-1 電子光斑面內干涉 2-1-2 電子光斑面外干涉量測 2-2 相平移法 2-3 有限單元法理論 2-3-1線彈性有限元素法理論基礎 2-3-2 材料非線性有限元素理論 第三章 影像後處理 3-1數位影像處理(digital image processing, DIP)簡介 3-2雜訊處理 3-2-1相位圖基本特性 3-2-2高斯濾鏡 3-3相位重建相關理論 第四章 電子光斑量測二維位移量之實驗設計 4-1以壓電傳感器實現相平移法量測二維位移量光路設計 4-2光學、影像截取系統 4-3實驗材料、設置與模擬結果 4-3-1 實驗材料與設置 4-3-2 模擬設置 第五章 實驗結果與討論 5-1 電子光斑面內量測之驗證 5-2 電子光斑面外量測之驗證 第六章 結論與未來展望 參考文獻

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