雷射鍍膜法製作PCMO緩衝層與其對PZT鐵電薄膜之影響研究

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研究生：	羅玉鄰
論文名稱：	雷射鍍膜法製作PCMO緩衝層與其對PZT鐵電薄膜之影響研究
指導教授：	林樹均教授林諭男教授
口試委員:
學位類別：	碩士 Master
系所名稱：	工學院 - 材料科學工程學系 Materials Science and Engineering
論文出版年：	2004
畢業學年度：	92
語文別：	中文
論文頁數：	88
中文關鍵詞：	雷射鍍膜
外文關鍵詞：	PCMO, PZT
相關次數：	點閱：3 下載：0
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本實驗以脈衝雷射鍍膜(PLD)鍍製(Pr0.67Ca0.33)MnO3，PCMO作為緩衝層，而Pb(Zr0.52Ti0.48)O3，PZT鐵電薄膜以有機金屬鹽裂解法鍍在有PCMO作為緩衝層之基板上。由於PCMO與PZT有相同鈣鈦礦結構，且晶格常數匹配，使得PZT材料得以在不嚴苛的條件下，在矽基板與白金基板上順利成長品質良好之薄膜。本文將探討製程參數對PCMO緩衝層結晶性質影響，以及使用PCMO作為緩衝層對PZT鐵電薄膜結晶性質與特性影響研究。

目錄………………………………………………………………………i
圖目錄……………………………………………………………………v
第一章 前言……………………………………………………………1
第二章 文獻回顧………………………………………………………3
2-1(R1-xAx)MnO3材料…………………………………………………3
2-1-1鈣鈦礦結構……………………………………………………3
2-1-2磁阻現象與類別………………………………………………4
2-1-3超巨磁阻材料之發展…………………………………………6
2-2脈衝雷射鍍膜法(pulsed laser deposition，PLD) …………………7
2-2-1雷射本身的影響………………………………………………7
2-2-2靶材的影響……………………………………………………8
2-2-3環境氣氛(ambient gas)的影響…………………………………9
2-2-4基板的影響……………………………………………………9
2-3 Pb(Zrx,Ti1-x)O3，PZT鐵電材料……………………………………10
2-3-1鐵電性質………………………………………………………10
2-3-2鈣鈦礦型(perovskite)鐵電材料………………………………13
2-4鐵電薄膜之發展……………………………………………………14
2-4-1鐵電薄膜製作方法……………………………………………15
2-4-2有機金屬鹽裂解法……………………………………………16
2-4-3薄膜的製程……………………………………………………19
2-5鐵電薄膜在微機電系統上之應用…………………………………21
2-5-1 微機電系統簡介……………………………………………21
2-5-2 記憶元件……………………………………………………22
2-5-3 積體光學元件………………………………………………23
2-5-4 感測元件……………………………………………………25
第三章 實驗方法………………………………………………………38
3-1基板製備……………………………………………………………38
3-2 PCMO薄膜製備……………………………………………………38
3-2-1 PCMO靶材製備……………………………………………39
3-2-2 脈衝雷射鍍膜設備…………………………………………39
3-2-3 脈衝雷射剝鍍步驟…………………………………………40
3-3 鋯鈦酸鉛鐵電薄膜之製備………………………………………41
3-3-1有機金屬化合物之金屬成份定量……………………………41
3-3-2鋯鈦酸鉛薄膜製程……………………………………………41
3-4 特性量測…………………………………………………………43
3-4-1 X光繞射分析(XRD) …………………………………………43
3-4-2掃描式電子顯微鏡（SEM）…………………………………43
3-4-3AFM原子力顯微鏡分析……………………………………43
3-4-4極化強度-電場量測 ( P-E ) …………………………………43
3-4-5電流-電壓的量測 ( I-V ) ……………………………………43
3-4-6疲勞測試(Fatigue) ……………………………………………44
第四章 結果與討論……………………………………………………47
4-1 脈衝雷射鍍膜法鍍製PCMO薄膜………………………………47
4-1-1 基板溫度對薄膜成長之影響……………………………47
4-1-2 氣體種類與壓力對薄膜結構之影響……………………48
4-1-3 雷射輸出功率對薄膜結晶構造之影響…………………49
4-1-4 脈衝重複率對薄膜結晶行為之影響……………………49
4-1-5 鍍膜時間對薄膜結晶行為之影響………………………50
4-2 PCMO薄膜的特性…………………………………………………52
4-2-1 熱處理對PCMO薄膜表面形貌影響……………………52
4-2-2 PCMO薄膜漏電流特性……………………………………53
4-3 PCMO薄膜對PZT鐵電層之緩衝層效應…………………………53
4-3-1 降低PZT薄膜製程溫度…………………………………53
4-3-2 指導PZT成長晶向………………………………………54
4-3-3 使PZT薄膜表面均勻化…………………………………55
4-3-4 降低PZT薄膜漏電流……………………………………55
4-3-5 提高PZT薄膜耐疲勞程度………………………………55
第五章 結論……………………………………………………………82
參考文獻………………………………………………………………83

                                

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