研究生: |
林怡秀 Lin, I-Hsiu |
---|---|
論文名稱: |
大氣電漿氧化矽鍍膜之研究 Investigations of SiOx thin films by an atmospheric plasma source |
指導教授: |
寇崇善
Kou, Chwung-Shan |
口試委員: |
黃振昌
劉偉強 |
學位類別: |
碩士 Master |
系所名稱: |
理學院 - 物理學系 Department of Physics |
論文出版年: | 2011 |
畢業學年度: | 99 |
語文別: | 中文 |
論文頁數: | 78 |
中文關鍵詞: | 大氣電漿 、六甲基矽氧烷 |
外文關鍵詞: | LAPPJ, HMDSO |
相關次數: | 點閱:2 下載:0 |
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本研究利用介質屏障放電(dielectric barrier discharge,DBD)進行大氣輝光放電,以六甲基矽氧烷(Hexamethyldisiloxane,HMDSO)為單體,混合氧氣、氫氣、氮氣、氬氣鍍膜。探討單體流量、混合不同氣體所製備之薄膜。並利用傅氏轉換紅外線光譜儀(FT-IR)、化學分析電子儀(ESCA)、接觸角量測系統、橢圓偏光儀(ellipsometer)、原子力顯微鏡(AFM)、紫外光-可見光光譜儀(UV-Vis)及鉛筆硬度測試薄膜特性。
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