本論文在於研究如何利用二維金屬孔洞陣列產生三倍頻，電磁波與金屬交互作用後會產生奈米電漿子 (Plasmonic)，我們希冀能利用奈米電漿子增強金屬本身的非線性效應；因此我們利用數學推論最佳的結構，使用有限時域差分法進行模擬分析並驗證其結果，探討不同結構下奈米電漿子產生的情況以及三倍頻的產生結果。
製程上，我們利用熱蒸鍍的方式進行鍍膜，使用聚焦離子束製作結構；我們使用中心波長1560 nm 且脈衝寬約為60飛秒的脈衝雷射做為激發光源，其重複率為80MHz，平均功率約為110mW，我們將其聚焦在樣品中心，並利用自行架設的水平上成像系統，觀測非線性訊號的產生，利用量測到的數據，進行強度相依性的比較，因此我們可以很明確得知產生了三倍頻。

In this work, we study how to use two-dimensional metallic hole arrays for three harmonic generation. After he interaction of electromagnetic waves with metal and dielectric, plasmonic would be produced. We hope we can take advantage of plasmonic to enhance nonlinear effect of the metal. Therefore we do simulation analysis by using the FDTD method and verify the results.
In the experiment, we use thermal evaporation to coat the gold film upon to the substrate. We make the structure by using focused ion beam. A pulse laser is used at 1560 nm wavelength and roughly 60 fs pulse duration. Its repetition rate is 80MHz and its average power is 110 mW. We are using the self-set up imaging system to measure nonlinear signal and confirm the one is third harmonic generation by power relation.

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