本論文提出應用半導體產業成熟的電漿輔助化學氣相沉積法堆疊氮化矽/氧化矽薄膜製作雷射干涉重力波偵測器之大面積高品質反射鏡。內容分為兩部分，前半部探討不同成份的氮化矽薄膜與氧化矽薄膜的材料特性，包含結構、光學折射係數、消光係數、楊氏係數、應力與室溫和低溫機械損耗，這些材料特性對於雷射干涉重力波偵測器的高反射鏡應用非常重要且切題。研究結果發現，氮化矽薄膜的材料特性大多與成份比有關，於應用波長1550奈米的折射係數隨薄膜的氮矽比增加而下降，範圍從2.28到1.78；消光係數均坐落在10-5範圍。楊氏係數與應力也隨氮矽比增加而上升；氮化矽薄膜的室溫機械損耗於研究重點頻率區間坐落於低階10-4到低階10-5；不同成份比的氮化矽薄膜具有截然不同的低溫機械損耗，低氮矽比的氮化矽薄膜呈現低且平坦的低溫機械損耗，但是高氮矽比的氮化矽薄膜則具有機械損耗峰值。這與薄膜材料中的鍵結濃度有關，針對低溫損耗與鍵結的關聯，我們提出與N-H鍵、Si-H鍵與Si-N鍵相關的Two-level system，並推斷造成高氮矽比的氮化矽薄膜具有低溫機械損耗峰值的原因是來自N-H鍵中H+與孤對電子對交換位置所造成。
後半部分透過光學模擬軟體Essential Macleod設計氮化矽/氧化矽堆疊高反射鏡的堆疊結構並評估其光學穿透與吸收，並首次透過Bulk and shear loss angles評估氮化矽/氧化矽堆疊高反射鏡結構的熱雜訊，將這些評估結果與下世代的重力波偵測器規格做比較，結果說明氮化矽/氧化矽堆疊高反射鏡結構的熱雜訊與下世代雷射干涉重力波偵測器的規格相近，證明氮化矽/氧化矽堆疊結構應用於LIGO高反射鏡的可能性，並透過multimaterial的設計有效的改善光學吸收的缺點，將光學吸收從45.9 ppm下降到2 ppm，符合LIGO Voyager與ET-LF的規格。

Silicon is a candidate substrate for the large-area-size mirror of next-generation laser interferometer gravitational wave observatory’s (LIGO) detectors in cryogenic temperature. Therefore, the silicon-compatible coating materials and deposition process will become significant for LIGO mirror coating. It is a common practice in the silicon integrated circuit industry to deposit silicon nitride and silica thin films uniformly by using a chemical vapor deposition method on large-size silicon wafers. We utilized the plasma-enhanced chemical vapor deposition (PECVD) method to deposit silicon nitride and silica films on silicon cantilever substrate and studied the physical properties of films which are pertinent to the application of the high-reflective (HR) mirror coatings of LIGO. The optical and mechanical properties were measured and analyzed, including the optical refractive indices, extinction coefficients, energy gaps, structure, Young’s moduli, stress, and mechanical loss angles at both room and cryogenic temperatures. Those properties are all depended on the composition of the films which is determined by using the X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FTIR). Optical refractive indices and extinction coefficients of the silicon nitrides were ranged from 2.28 to 1.78 and were in the 10-5 range at 1550-nm wavelength, which is a candidate laser wavelength for the next-generation detectors, respectively. Mechanical loss of the films in room temperature was various from low 10-4 to low 10-5 within the frequency range which is interested. The cryogenic mechanical loss peak of the coating materials was correlative to the bond concentrations in the films, including N-H, Si-H, Si-N, and Si-Si bonds. Three possible two-level systems (TLSs) which are associated with the N-H, Si-H, and Si-N bonds was proposed for our film. In addition, we inferred that the TLS of exchanging position between an H+ and electron lone pair associated with the N-H bond is the dominant source of the cryogenic mechanical loss for the silicon nitride films. The TLSs associated with S-H and Si-N bonds were minor loss source of the mechanical loss in cryogenic temperature.
We also selected the silicon nitride film which has superior properties regarding high refractive index, low optical absorption, low mechanical loss, and without cryogenic loss peak together with the silica film to pile the silicon nitride/silica quarter-wave (QW) multilayer stacks. The mechanical loss angles of the silicon nitride/silica QW bilayer were measured by using the cantilever ring-down system both at the room- and cryogenic temperatures. We showed, for the first time, that the bulk and shear loss angles of the coatings can be obtained from the cantilever ring-down measurement, and we used the bulk and shear losses to calculate the coating thermal noise of silicon nitride/silica high-reflector coatings. An optical simulation software Essential Macleod were used for designing the HR mirror structures which satisfied the optical requirements for the next-generation gravitational wave detectors, ET-LF, KAGRA, and LIGO Voyager. The coating thermal noise of the silicon nitride/silica HR mirror stack is compared to the lower limit of the coating thermal noise of the end test mirrors of ET-LF, KAGRA, LIGO Voyager, and the directly measured coating thermal noise of the current coatings of Advanced LIGO. The optical absorption of the silicon nitride/silica high reflector at 1550 nm is 45.9 ppm. A multimaterial system composed of seven pairs of ion-beam-sputter deposited Ti:Ta2O5/silica and nine pairs of silicon nitride/silica on a silicon substrate were designed for the optical improvement. And the optical absorption can be reduced from 45.9 to 2 ppm that meets the specification of LIGO Voyager.

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