FePd合金材料在磁性儲存元件上是具有潛力的候選材料之一，本實驗以真空直流磁控濺鍍的方式沉積Fe/Pd多層膜到室溫的MgO[001]基板上，並且以同步輻射X光量測來驗證多層膜成長方式可以讓FePd-FCT晶粒的a、b軸方向沿著膜面而讓c軸垂直於膜面，實驗將濺鍍完成的Fe/Pd多層膜以700℃在真空環境退火2-10小時，利用感應偶合電漿質譜儀、能量分佈X光光譜、X光反射率、X光繞射、X光吸收對樣品的元素組成和結構進行分析以及討論。
實驗發現濺鍍完成的未退火樣品其結構是具有非晶形多孔性多層膜的結構，而隨著退火時間的增加，膜厚以及多孔性的下降表示膜密度的上升，表示Fe/Pd多層膜逐漸轉為單層的FePd合金，X光繞射圖譜在退火樣品只有發現FePd-FCT結構中沿著c軸方向的[001]和[002]繞射峰且從Rocking-curve可以看到具有優選取向，代表FePd-FCT的晶粒容易長成c軸垂直於膜面，而從X光吸收光譜模擬以及擬合結果可以得知退火後的樣品Fe原子局部結構符合FePd-FCT結構，表示其他如Fe-BCC、Pd-FCC或者FeO的含量極少。

We aimed to study the local structure change as amorphous FePd multilayer transformed into the ordered face-center-tetragonal FePd under annealing. [Fe (2 nm)/Pd (2 nm)]30 multilayer on MgO [001] substrate were prepared using a home-built magnetron sputtering system. As made samples were annealed at 2, and 10 hours at 700 ℃ in high vacuum condition. From the EXAFS analyses for the nearest scattering paths of Fe-Fe and Fe-Pd, we found that despite the inversive change in the lattice parameters c and a, the c/a ratio and cell volume of the FePd became smaller which demonstrates a more compact structure of FePd as an effect of longer annealing time.

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