近十幾年的半導體產業蓬勃的快速發展下，製造元件的特徵尺寸越來越小的趨勢，傳統的浸潤式光學微影技術已面臨了因可見光波長而限制了傳統光學微影的解析度，極紫外光與自組裝薄膜一直被學界與業界期待能突破此技術瓶頸的下一代光學微影技術。在諸多自組裝薄膜材料中，星形三嵌段共聚高分子(PS9.3-b-PDMS10.1)3為極具潛力的材料之一，因其具備有高的蝕刻選擇性與具備10~20 奈米高解析能力之黃光微影所需光罩，可經由調節熵來驅動高分子自我調整組裝成垂直柱狀有序的結構。本實驗以自行設計之微機電加熱晶片及加熱樣品桿在穿透式電子顯微鏡進行熱退火來觀測(PS9.3-b-PDMS10.1)3垂直柱狀結構隨時間的演變過程，熱退火溫度落在300℃，並以COMSOL三維熱模擬及實際偵測加熱功率對電阻的變化曲線來校正微型加熱晶片的溫度，晶片熱模擬顯示在0.16 mm2範圍內溫差約為5℃以內，另以Image Pro Plus影像處理軟體來計算TEM影像視野下轉換成垂直柱狀結構的百分比，藉由晶片上多孔視窗輪流觀測方式可有效減少電子束對(PS9.3-b-PDMS10.1)3所造成的輻射損傷，並觀測(PS9.3-b-PDMS10.1)3反應退火初期開始成核與有序柱狀結構的成長，並且統計相變化比率與薄膜系統JMAK的機制討論。

In the recent rapid development of the semiconductor industry in the past decade, the feature sizes of manufacturing components have been getting smaller and smaller. Traditional immersion optical lithography technology has faced the limitation of the resolution due to the wavelength of visible light. Extreme ultraviolet and self-assembled thing films have seen as the candidates for the next-generation optical lithography technology. Both of them are expected by academics and the industry to break through this technological bottleneck. Among the many self-assembled film materials, three arms triblock polymer (PS9.3-b-PDMS10.1)3 is one of the most promising materials, because it has the higher etching selectivity and its 10 nm high resolution capability as a photomask, which regulating the entropy drives copolymer self-assembly into a vertical columnar ordered structure is required for the photolithography. In this TEM experiment, a self-designed micro heater and micro holes are fabricated by MEMS process, which can effectively reduce the radiation damage caused by the electron beam. A home-made sample holder with the micro heater was subjected to TEM for in situ observing the evolution of the (PS9.3-b-PDMS10.1)3 vertical columnar ordered structure over time at the annealing temperature 300°C. Utilizing three-dimensional thermal simulation by COMSOL Multiphasic and the detection of heating power on the resistance curve align the temperature of micro heater. Thermal simulation shows a temperature difference of heater surface is about 5 °C in the area of 0.16 mm2.
In the final results, we demonstrate the transformation of the vertical cylinder structures of the (PS9.3-b-PDMS10.1)3 from the snap shot of TEM images with the different time frame. The analysis of the phase transformation of the copolymer from disordered to ordered shows the mechanism of the modified JMAK in the thin film.

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