摘要：
在現今之半導體製造業裡，對於元件的微小化，製造的尺寸也越來越小，因此，對於半導體製程控制之要求也越來越精準。對銅製程化學機械研磨來說，目前面臨的困境為產品少量多樣，影響製程穩定性的變數太多，導致在製程的控制上的不容易。
在本篇論文中，將會介紹有關共變異分析之原理，並根據工廠所提供之實際數據來進行製程分析與建立模型，並嘗試重建與線上製程近似之模型。為了解決因產品少量多樣所造成之製程偏差，我們利用經共變異分析而建立之模型，去對線上製程之控制策略作再調整的動作，以期望能有效的修正製程偏差。

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