研究生: |
翁儷瑜 Li-Yu Weng |
---|---|
論文名稱: |
熱感應分子應用在奈米製造研究 Applications of Rhodamine B Molecules for Nanofabrication |
指導教授: |
朱鐵吉
Tieh-Chi Chu |
口試委員: | |
學位類別: |
碩士 Master |
系所名稱: |
原子科學院 - 生醫工程與環境科學系 Department of Biomedical Engineering and Environmental Sciences |
論文出版年: | 2004 |
畢業學年度: | 92 |
語文別: | 中文 |
論文頁數: | 91 |
中文關鍵詞: | 若丹明 、電子束微影 、奈米壓印微影 、熱感應 |
外文關鍵詞: | Rhodamine B, electron beam lithography, nanoimprint lithography, temperature-sensitive |
相關次數: | 點閱:3 下載:0 |
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在很多研究領域和工業過程中,溫度一直是控制反應動力學、產品良率及反應過程的一項重要參數,對溫度的測量,傳統則採用像溫度計和熱電偶的物理探測器,這些探測器通常具有使用上的限制,例如:它們具有既定的大小,無法適用於小體積的測量;外加電場或磁場會對物理探測器的測量產生干擾。因此,當我們採用若丹明或其他溫度感測的螢光染劑,來做熱效應量測時,不但可以克服物理感測器使用上的侷限,也可以直接量測溫度,用來評估電子束微影製程中所產生的熱對關鍵尺寸造成的形變。
本論文分為三部份,第一部份為針對若丹明的溫度感測特性及
機制進行探討,以及熱動力學相關參數之求得;第二部分為將若丹明應用於電子束微影,對電子束劑量所對應的溫度進行評估,以及不同基材所呈現的溫度差異現象;第三部分利用若丹明對奈米壓印微影的壓印溫度之準確度進行驗證,以及奈米壓印微影的模板之製作,並將模板應用於不同壓印溫度,進而對壓印圖案的轉移完整性做評估。
In many research and industrial processes, temperature is a key parameter governing reaction kinetics, product performance, and process control. Conventionally, physical probes such as thermometers and thermocouples are used to measure temperature. These probes often have limited utility. Typical limitations include their physical size, their interference with applied electric or electromagnetic fileds. Hence, we adopt temperature-sensitive fluorescent dye such as Rhodamine B or any others to evaluate thermal effect. Fluorescent probes not only overcome the limitations of physical probes but also allow temperature measurements directly to evaluate the distortion of critical dimension due to heating in electron beam lithography.
This thesis contains three parts. First, we try to study the temperature-sensitive characteristics and mechanism of Rhodamine B and explore the parameters about thermodynamics. Second part, application of Rhodamine B in electron beam lithigraphy to evaluate the temperature corresponding to exposure dose and observe the phenomenon of temperature difference using different materials. Third part, using Rhodamine B to test and verify the accuracy of imprint temperature in Nanoimprint lithography(NIL). Using NIL molds fabricated in different imprint temperatures evaluate the transfer integrity of defined pattern.
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