本文利用1H(19F, αγ)16O核反應所產生的伽瑪射線(γ-ray)，測量在A6061鋁合金樣品上抽氣時因絕熱膨脹效應所形成的水氣附著量，並觀察不同分壓之氮氣與水氣混合時對絕熱膨脹效應造成的影響。此外，為了提高實驗的訊號強度，本實驗改善了部份系統，並利用輝光放電清洗以降低樣品背景信號。並且也以Ansys程式模擬在離子束照射時樣品溫度的改變，以探討對於絕熱膨脹的影響程度。
從實驗結果可看出，絕熱膨脹造成的溫度下降會讓伽瑪射線計數值增加，亦即表面水氣含量增加；而輝光放電清洗可以顯著地降低表面水氣(H)的背景信號。

參考文獻：
1.K. M. Welch, “The pressure profile in a long outgassing vacuum tube,” Vacuum 23, 271(1973).
2.Y. C. Liu, S. C. Wu, J. R. Chen and H. S. Tzeng, “The Outgassing and Pumping Effect of an Ultrahigh Vacuum System,” Chinese J. of Physics, 23(4), 273(1985).
3.John F. O'Hanlon, “A User's Guide to Vacuum Technology,” John Wiley & Sons, New York (1980).
4.李仁佑，“真空中絕熱膨脹水氣吸附作用之討論”，碩士論文，國立清華大學原子科學系，(2003).
5.John F. O'Hanlon and Jhy-Jer Shieh, “Reduction of water aerosol contamination during pumping of a vacuum chamber from atmospheric pressure,” J. Vac. Sci. Technol. A 9(5), 2802(1991).
6.R. Nuvolone, “Technology of low pressure systems - establishment of optimum conditions to obtain low degassing rates on 316 L stainless steel by heat treatments,” J. Vac. Sci. Technol., Vol.14, No.5, 1210(1977).
7.陳俊榮，曾湖興，劉遠中，“鋁合金超高真空系統的研究,”，核子科學 24(1), 25(1987).
8.J.R. Chen, M.H. Wang, H.S. Tzeng, and Y.C. Liu, “The study of glow discharge cleaning for stainless steel ultrahigh vacuum chamber,” J. of Vac. Soc. of R.O.C. 1(1), 13(1987).
9.S.S. Inayoshi, S. Tsukahara, A. Kinbara, “Decrease of water vapor desorption by Si film coating on stainless steel,” Vacuum 53, 281(1999).
10. Y.C. Liu, J.R. Huang, C.Y. Wu, J.R. Chen, “Thermal out- gassing study on aluminum surface with different venting humidities,” Journal of Vacuum Society of ROC, 5(3,4) 8-13(1992).
11.徐鴻特，“真空中絕熱膨脹作用之探討”，碩士論文，國立清華大學原子科學系，(2001).
12.林志龍，“利用核反應分析術分析真空中水氣”，碩士論文，國立清華大學原子科學系，(2006).
13.Y. Iwata, F. Fujimoto, E. Vilata, A. Otuka, K. Komaki, K. Kobayashi, H. Yamashita, Y. Murata, “Detection of Hydrogen adsorption on tungsten surfaces using 1H(15N, αγ)12C,” Nucl. Instr. And Meth. B33 (1988) 574-577.
14.G. K. Vemulapalli, “Physical Chemistry,” Prentice-Hall International, New Jersey, (1993).
15.P. A. Redhead, J. P. Hobson, E. V. Kornelsen, “The Physical Basis of Ultrahigh Vacuum,” Willmer Brothers Limited, Birkenhead, (1968).
16.成島勝也，石丸肇，真空 25(2), 16(1982).
17.Francis W. Sears, Gerhard L. Salinger, ”Thermodynamics, Kinetic Theory, and Statistical Thermodynamics 3rd edition,” Addison-Wesley Publishing Company, Philippine, (1975)
18.J. R. Chen, G. Y. Hsiung, Y. J. Hsu, S. H. Chang, C. H. Chen, W. S. Lee, J. Y. Ku, C. K. Chan, L. W. Joung and W. T. Chou, “Water adsorption-desorption on aluminum surface,” Applied Surface Science (169-170), 679 (2001).
19.楊福家，趙國慶， “離子束分析”，復旦大學出版社，上海，(1985).
20.Fulin Xiong, F. Rauch, Chengru Shi, Zhuying Zhou, R. P. Livi and T. A. Tombrello, “Hydrogen Depth Profiling in Solids: A Comparison of Several Resonant Nuclear Reaction Techniques,” Nucl. Instr. And Meth. in Physics Research, B27 (1987).
21.Michael A. Lieberman, Allan J. Lichtenberg, “Principles of Plasma Discharges and Materials Processing,” John Wiley & Sons, New York, (1994).
22.A. G. Mathewson, J. P. Bacher, K. Booth, R. S. Calder, G. Dominichini, A. Grillot, N. Hilleret, D. Latorre, F. Le Normand, and W. Unterlerchner, “Comparison of chemical cleaning methods of alumium alloy vacuum chambers for electron storage rings,” J. Vac. Sci. Technol. A 7(1), 77(1989).
23.S. J. Pearton, J. W. Corbett, and M. Stavola, “Hydrogen in crystalline semiconductors,” Springer Verlag, Berlin, (1992).