目前傳統的低壓電漿源已經廣泛的應用在各個領域中，但由於低壓電漿源需要昂貴的真空設備系統，且處理材料的尺寸會受到真空系統的限制，所以對附加價值較低且需要大產量的傳統產業，例如紡織業與造紙業等，其應用成本偏高而未具競爭力。因此未來希望能夠以操作成本低、處理速度快的大氣電漿源來取代。由於目前已經發展出的大氣電漿源，如電漿火炬、暈光放電和介質屏蔽放電，都有高溫或低均勻性的問題，而低溫且均勻度高的圓柱型大氣電漿束在材料處理上又受限於噴焰面積小，處理效率低。因此，本實驗致力於發展出低溫、均勻且大面積的平板型大氣電漿束。本研究的重點在於利用Langmuir probe、V-I probe、OES和Contact angle等量測工具來量測平板型大氣電漿束的基本特性，包括腔體的電漿密度和噴焰的電漿密度、電子溫度，並對產生的活性粒子作分析。實驗中通入氦氣和氬氣，並且藉由改變輸入功率和氣體流量來探討電漿特性的變化。實驗結果發現，平板型大氣電漿束的腔體內部電漿密度約為1011-1012cm-3，而噴焰部分的電漿密度約為108cm-3；電子溫度為2-6eV。電漿中的活化粒子以原子自由基為主。此外，在材料處理方面，經由電漿處理後的PCB板和FR4板，接觸角都大幅下降，且極性表面能也獲得大量的提高。

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