研究生: |
林柏衡 Po-Heng Lin |
---|---|
論文名稱: |
微觸印刷技術之壓合機制及動態分析 Pressing Mechanism and Dynamic Analysis of Micro-contact Printing |
指導教授: |
王培仁
Pei-Jen Wang |
口試委員: | |
學位類別: |
碩士 Master |
系所名稱: |
工學院 - 動力機械工程學系 Department of Power Mechanical Engineering |
論文出版年: | 2005 |
畢業學年度: | 93 |
語文別: | 中文 |
論文頁數: | 95 |
中文關鍵詞: | 微觸印刷 、壓印力 、摩擦力 |
外文關鍵詞: | Micro-contact Printing, Imprint Forces, Frictional Forces |
相關次數: | 點閱:2 下載:0 |
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隨著加工線寬與線距的不斷縮小,近年來奈米轉印微影技術已逐漸成為次世代微電子及光電產業的重要製程技術之一,而屬奈米轉印微影技術範疇中的微觸印刷術因為具備大面積轉印圖案、軟質模仁技術、低壓印壓力及常溫無光源輔助等製程特性,除了運用在半導體產業之外,更適合運用在光電產業上玻璃基板及光學透鏡製造,而以化學方式生成自組性分子膜製程技術,製成之高分子薄膜穩定性高,極適合應用於微機電元件及生物晶片之製造,故具應用範圍廣、製造成本低、產出率高之製程技術優點。
在微觸印刷製程設備中,壓合機構的力量控制為相當重要的一項關鍵技術,故本論文針對微觸印刷設備控制模式及運動方式對壓印力進行分析,並以壓印力分析之數學模型,獲知壓印力與設備部件選用、配置之關係,而後經由實驗驗證壓印力分析數學模型替代直接量測壓印力的可行性,完成對於元件選用、機構配置對壓印力的影響分析,以期於設備設計或改良初期,即以簡單的數學預估該設備的壓印力出力範圍,並以此建立較完整之微觸印刷壓合機構。
Along with the continuous reduction in line-width and line-space, nano-imprint lithography has been gradually emerging into the fabrication of microelectronic and optoelectronic devices. More recently, it has become an important manufacture technology for the next generation technology. Micro-contact printing technology, one of the nano-imprint technologies, has been attractive because of the advantages in large imprint area, soft mold template, low process pressure, and low process temperature without UV curing. Except for the applications in semiconductor industry, it is more applicable for imprinting patterns on glass substrates or lenses in the optophotonic industry compared to other nanoimprint technologies. Moreover, it transfers patterns in a chemical way so that a thin self-assembled monolayer is stably formed with desired patterns; therefore, it is commonly employed for the fabrication of MEMS devices and biochips today. Because of the characteristics of low-cost and high-throughput, the micro-contact printing technology is famous in the nano-imprint technology.
In this thesis, it is noted that the control of imprint forces exerted by the press mechanism is the key research topic. Hence, analysis of both control and motion mechanisms for the micro-contact printing equipment is conducted. The imprint forces and pertinent mathematical models have been studied in order to select correct components and theorize the effects of imprinting. Then, verifications on the feasibility of the models have been conducted by experimentation. Finally, it is expected to preview the design and improvement of equipment in early stage so that a complete mechanism of micro-contact printing can be visualized.
參考文獻
[1] International Technology Roadmap for Semiconductors:http://public.itrs.net/
[2] S. Y. Chou, P. R. Krauss and P. J. Renstrom, (1995) “Imprint of Sub-25 Vias and Trenches in Polymers”, Appl. Phys. Lett.,Vol.67,pp.3114-3116.
[3] Y. Xia and G. M. Whitesides, (1998) “Replica Molding with a Polysiloxane Mold Provide this Patterned Microstructure”, Angew. Chem. Int. , Vol. 37, pp.550-575.
[4] M. Bender, M. Otto, B. Hadam, B. Spangenberg, and H. Kurz, (2000) “Fabrication of Nanostructures Using a UV-based Imprint Technique”, Microelectronic Engineering, Vol. 53, pp.233-236.
[5] M. Otto, M. Bender, B. Hadam, B. Spangenberg, and H. Kurz, (2001) “Charaterization and Application of a UV-based Imprint Technique”, Microelectronic Engineering, Vol. 57-58, pp.361-366.
[6] S. Y. Chou, C. Keimel and J. Gu, (2002) “Ultrafast and Direct Imprint of Nanostructures in Silicon”, Nature, Vol. 417, pp.835-837.
[7] T. B. Burgin, V. Choong, G. N. Maracas and T. M. Mance, (1999) Printing Apparatus with Inflatable Means for Advancing a Substrate Towards the Stamping Surface ”, U.S. Patent NO.5947027.
[8] L. Mueller, F. Reuther, A. Springer, M. Heckele and H. Biedermann, (1999) “Apparatus for Molding Microsystem Structures” U.S. Patent, NO.5993189.
[9] B. Heidari, (2001) “Device and Method in Connection with the Production of Structures”, World Patent 01/42858 A1.
[10] L. Montelius, B. Heidari and T. Stjernholm, (2001) “Device for Transferring a Pattern to an Object”, World Patent 01/69317 A1.
[11] K. Naito, (2002) “Device and Method for Transfer”, JP Pub. NO. 2002/100079.
[12] S. Y. Chou , (2002) “Fliud Pressure Imprint Lithography”, World Patent 02/07199 A1.
[13] B. J. Choi, R. D. Voisin, S. V. Sreenivasan, M. P. C. Watts, C. G. Willson and N. E. Schumaker, (2004) “Method for Modulating Shapes of Substrates”, U.S. Pub. No. 2004/0112861 A1.
[14] Austria, EV Group:http://www.evgroup.com/
[15] America, Molecular Imprint Inc.:http://www.molecularimprints.com/
[16] America, Nanonex:http://www.nanonex.com/
[17] Sweden, Obducat:http://www.obducat.com/
[18] Germany, Süss MicroTec:http://www.suss.com/
[19] Japan, THK 綜合商品目錄,THK CO. LTD.,NO.300T。
[20] Japan, CKD:http://www.ckd.co.jp。
[21] Austria, RSF :http://www.rsf.net/。
[22] 林家弘、許嘉峻,2003年6月,「奈米製造技術的新契機-奈米轉印微影術及其設備發展現況」,機械工業雜誌243期, pp.130-141。
[23] 鍾永鎮,2003年6月,「奈米轉印設備之專利分析」, 機械工業雜誌243期, pp.163-168。
[24] 陳釧鋒,2004年6月,「奈米轉印製程與設備技術發展現況」, 機械工業雜誌255期, pp.151-162。
[25] 杜光宗,「精密定位技術及其設計技術」,建宏出版社,1992年。
[26] 洪榮哲,「機構設計:精密定位法」,全華出版社,初版,1998年。
[27] 馮榮豐,「奈微米工程-精密製程與量測技術」,滄海出版社,初版,2002年。