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研究生: 許家銘
Andrew Chia-Ming Hsu
論文名稱: 金屬界面在電遷移效應下之成長
A generalized phenomenological model for the effect of electromigration on interfacial reaction
指導教授: 汪上曉
David Shan-Hill Wong
口試委員:
學位類別: 博士
Doctor
系所名稱: 工學院 - 化學工程學系
Department of Chemical Engineering
論文出版年: 2008
畢業學年度: 97
語文別: 英文
論文頁數: 89
中文關鍵詞: 電遷移介金屬像成長介面反應模型
外文關鍵詞: electromigration, IMCs growth, interfacial reaction, model
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  • Intermetallic compounds (IMCs) formation is important for the reliability of microelectronic devices, especially for flip chip solder joint. It can be accelerated or decelerated by imposing a direct electric current normal to the interface. These effects are analyzed by including electromigartion-driven and back stress-dominated interchange of atomic species in a conventional analysis of reaction layer growth in a binary system controlled by interdiffusion.
    This dissertation research consists of two parts that are related to the IMCs growth between the two different composites. The first part of the dissertation involves the development of a generalized phenomenological model for use in the interpretation of effects of electromigration on IMC growth by considering reaction and diffusion of two species. When both reaction and mass transfer are important, the model predicts cathode thickening and anode thinning if the electro-migration effect on the dominant diffusion species is more pronounced. Cathode thinning and anode thickening occur when the electro-migration effect on the minor diffusion species is more pronounced. Simultaneous cathode and anode thinning happens when there are two diffusion species and the diffusion and electro-migration fluxes are comparable. Simultaneous cathode and anode thickening occurs when mass transfer is the limiting step and diffusion flux is negligible compared to electromigration. This model was found to be consistent with experiment data on IMC growth in the literature given the limited amount of information on effective charge of various species
    The second part of the dissertation research concerns the formation of unusual cruciform pattern at the interface between two different components. During the interaction of some solid-liquid and solid-solid system, the interaction layers have been observed to give rise to an unusual cruciform pattern. We propose that this morphology after reaction was directly dependent on the nature of the solid substrate during the growth. Depending on the diffusion process, two cases have to be considered. If the direction of metalloid diffusion is from the outside to the inside, the building of the layer occurs under the initial interface. And if the free volume of solid substrate is much smaller than the atomic volume of diffusing atom, stresses appear in the layers and result in rupture at the corners. A cruciform pattern will be observed. Contrarily, if the free volume of solid substrate is much larger than the atomic volume of diffusing atom, the edges should take a convex shape. This mechanism must be substantiated by more experimental studies


    Abstract I Acknowledge…………………………………………………………………………III Tables of Content IV List of Figures VI List of Tables IX Chapter 1 Introduction 1 1.1 Electromigration 1 1.1.1 Electromigration in General 1 1.1.2 Physics of Electromigration 2 1.2 Electromigration in Electronics Packaging 3 1.2.1 Electromigration in Interconnects 4 1.2.2 Electromigration in Solder Joints 6 1.3 Motivation, Scope and Organization 8 Chapter 2 Overview of Electromigration on Kinetics of IMCs Growth 10 2.1 Experimental Data 10 2.2 Model of Interfacial Reaction with Electromigration 25 Chapter 3 Growth Kinetics of IMCs 29 3.1 Reaction Diffusion 29 3.2 Reaction Diffusion with Electromigration 32 Chapter 4 Effect of Electromigration on Diffusion-Reaction Growth 36 4.1 Basic Assumption 36 4.2 One Major Diffusion Species, Electromigration Effects on The Two Diffusion Species are Comparable 37 4.3 One Major Diffusion Species, Electromigration Effect on The Major Diffusion Species is More Important 39 4.4 One Major Diffusion Species, Electromigration Effect on The Minor Diffusion Species is More Important 42 4.5 Two Major Diffusion Species, Electromigration Effect on Both Species are Significant 45 4.6 Two Major Diffusion Species, Electromigration Effect on One Species is Significant 48 4.7 Reconciliation with Experimental Data 53 4.7.1 Cathode Enhancement and Anode Suppression 53 4.7.2 Cathode Suppression and Anode Enhancement 53 4.7.3 Simultaneous Enhancement 54 4.7.4 Simultaneous Suppression 54 4.8 Summary 55 Chapter 5 The Formation of Cruciform Pattern During the Interfacial Reactions 57 5.1 Introduction 57 5.2 Summary of Experimental Data 58 5.3 Mechanism of The Cruciform Pattern Formation 67 5.4 Free Volume Consideration 73 5.5 Summary 79 Chapter 6 Conclusions 80 Notation………………………………………………………………………………82 References 84

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