研究生: |
劉景文 Liu, Ching-Wen |
---|---|
論文名稱: |
微米及奈米複合式結構應用在光學膜片之研究 Micro and Nano hybrid structure applied in optical films |
指導教授: |
蔡宏營
Tsai, Hung-Yin |
口試委員: |
陳政寰
林宏彛 林景崎 蔡宏營 |
學位類別: |
碩士 Master |
系所名稱: |
工學院 - 動力機械工程學系 Department of Power Mechanical Engineering |
論文出版年: | 2011 |
畢業學年度: | 99 |
語文別: | 英文 |
論文頁數: | 88 |
中文關鍵詞: | 光學膜 、奈米結構 、微米結構 、複合式結構 、奈米壓印 、陽極氧化鋁 |
外文關鍵詞: | optical film, nano-structure, micro-structure, hybrid structure, nano-imprint, anodic aluminum oxide |
相關次數: | 點閱:3 下載:0 |
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本研究提出以簡單的微奈米製程製作出微米以及奈米等級尺寸的複合式結構,並且利用奈米壓印技術製作在透明的高分子材料上,同時探討其光學之特性。
首先利用曝光、顯影以及蝕刻製作出微米等級尺寸的結構;再利用陽極氧化鋁製程製作出奈米等級尺寸的結構。在本研究中,利用草酸為電解液可以得到直徑為50奈米的孔洞結構;利用磷酸為電解液可以得到直徑為100奈米的孔洞結構。本研究發現利用草酸為電解液時,必須做二次處理才可以得到完整的孔洞結構。此外,利用草酸為電解液以及利用磷酸為電解液的實驗中,為了得到更整齊的孔洞結構,都進行二次處理。
完成的結構被當作模具並且利用奈米壓印成功地把結構轉移到透明的高分子材料上。壓印完成的透明高分子材料可應用為螢幕背光模組的擴散膜等光學膜。此光學膜經光學檢測後發現,比起沒有奈米結構的[空]片,其穿透率明顯地提高。
In this research, a micro and nano hybrid structure was realized by using simple micro and nano processing methods. Micro-structures generated by using exposure, development and etching processing; nano-sturctures were generated by using AAO processing.
Two different nano-structures were fabricated using this process, 50 nm nano-pores by using oxalic acid as electrolyte and 100 nm nano-pores by using phosphoric acid as electrolyte. Furthermore, for oxalic acid, second anodization was required to obtain nano-pores, also for both oxalic acid and phosphoric acid second anodization was used to obtain more ordered nano-pores.
The fabricated structures were used as molds in a nano-imprint lithography process where the structures were successfully transferred to a transparent polymer film. This transparent film can be applied to optical films such as the diffuser in a back lighting module.
The imprinted samples were tested for transmittance and compared with a “blank” sample, which has no nano-structures. Obvious increment in transmittance can be observed compared with the “blank” sample.
[1] G. Kim, "A PMMA composite as an optical diffuser in a liquid crystal display backlighting unit (BLU)," European Polymer Journal, vol. 41, pp. 1729-1737, 2005.
[2] H. Kuo, et al., "Design correlations for the optical performance of the particle-diffusing bottom diffusers in the LCD backlight unit," Powder Technology, vol. 192, pp. 116-121, 2009.
[3] J.-H. Wang, et al., "One-step fabrication of surface-relief diffusers by stress-induced undulations on elastomer," Optics & Laser Technology, vol. 41, pp. 804-808, 2009.
[4] G. Kim, et al., "Analysis of thermo-physical and optical properties of a diffuser using PET/PC/PBT copolymer in LCD backlight units," Displays, vol. 26, pp. 37-43, 2005.
[5] G. Kim and J. Park, "A PMMA optical diffuser fabricated using an electrospray method," Applied Physics A: Materials Science & Processing, vol. 86, pp. 347-351, 2007.
[6] D. Sakai, et al., "Direct fabrication of surface relief holographic diffusers in azobenzene polymer films," Optical Review, vol. 12, pp. 383-386, 2005.
[7] S. Chang, et al., "Microlens array diffuser for a light-emitting diode backlight system," Optics letters, vol. 31, pp. 3016-3018, 2006.
[8] M. Parikka, et al., "Deterministic diffractive diffusers for displays," Applied optics, vol. 40, pp. 2239-2246, 2001.
[9] M. Moharam and T. Gaylord, "Diffraction analysis of dielectric surface-relief gratings," JOSA, vol. 72, pp. 1385-1392, 1982.
[10] T. Huang, et al., "Fast fabrication of integrated surface-relief and particle-diffusing plastic diffuser by use of a hybrid extrusion roller embossing process," Opt. Express, vol. 16, pp. 440-447, 2008.
[11] C.-J. Ting, "Optical Properties of 3D Nanostructure arrayed Polymer Surfaces," PH.D, Institute of Mechanical Engineering, National Chiao Tung University, 2008.
[12] E. Hecht, Optics, 4th ed. San Francisco: Addison-Wesley, 2002.
[13] P. B. Clapham and M. C. Hutley, "Reduction of Lens Reflexion by the Moth Eye Principle," Nature, vol. 244, pp. 281-282, 1973.
[14] S. J. Wilson and M. C. Hutley, "The Optical Properties of 'Moth Eye' Antireflection Surfaces," Optica Acta: International Journal of Optics, vol. 29, pp. 993 - 1009, 1982.
[15] Y. Chang, et al., "Design and fabrication of a nanostructured surface combining antireflective and enhanced-hydrophobic effects," Nanotechnology, vol. 18, p. 285303, 2007.
[16] W. Min, et al., "Bioinspired broadband antireflection coatings on GaSb," Applied Physics Letters, vol. 92, p. 141109, 2008.
[17] R. Enger and S. Case, "Optical elements with ultrahigh spatial-frequency surface corrugations," Applied optics, vol. 22, pp. 3220-3228, 1983.
[18] Y. Kanamori, et al., "100 nm period silicon antireflection structures fabricated using a porous alumina membrane mask," Applied Physics Letters, vol. 78, p. 142, 2001.
[19] Z. Yu, et al., "Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff," Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 21, p. 2874, 2003.
[20] H. Masuda, et al., "Self-Ordering of Cell Arrangement of Anodic Porous Alumina Formed in Sulfuric Acid Solution," Journal of The Electrochemical Society, vol. 144, pp. L127-L130, 1997.
[21] F. Keller, et al., "Structural features of oxide coatings on aluminum," Journal of the Electrochemical Society, vol. 100, p. 411, 1953.
[22] O. Jessensky, et al., "Self-organized formation of hexagonal pore arrays in anodic alumina," Applied Physics Letters, vol. 72, pp. 1173-1175, 1998.
[23] V. P. Parkhutik and V. I. Shershulsky, "Theoretical modelling of porous oxide growth on aluminium," Journal of Physics D: Applied Physics, vol. 25, pp. 1258-1263, 1992.
[24] G. E. Thompson, "Porous anodic alumina: fabrication, characterization and applications," Thin Solid Films, vol. 297 pp. 192-201, 1997.
[25] A. Belwalkar, et al., "Effect of processing parameters on pore structure and thickness of anodic aluminum oxide (AAO) tubular membranes," Journal of Membrane Science, vol. 319, pp. 192-198, 2008.
[26] A. Li, et al., "Hexagonal pore arrays with a 50-420 nm interpore distance formed by self-organization in anodic alumina," Journal of Applied Physics, vol. 84, p. 6023, 1998.
[27] S. Hwang, et al., "Fabrication of highly ordered pore array in anodic aluminum oxide," Korean Journal of Chemical Engineering, vol. 19, pp. 467-473, 2002.
[28] S. Shingubara, et al., "Ordered Two-Dimensional Nanowire Array Formation Using Self-Organized Nanoholes of Anodically Oxidized Aluminum," Japanese Journal of Applied Physics, vol. 36, p. 7791, 1997.
[29] S. Ono, et al., "Controlling Factor of Self-Ordering of Anodic Porous Alumina," Journal of The Electrochemical Society, vol. 151, pp. B473-B478, 2004.
[30] Y. Zhao, et al., "A facile approach to formation of through-hole porous anodic aluminum oxide film," Materials Letters, vol. 59, pp. 40-43, 2005.
[31] M. Ghorbani, et al., "On the growth sequence of highly ordered nanoporous anodic aluminium oxide," Materials & Design, vol. 27, pp. 983-988, 2006.
[32] F. Nasirpouri, et al., "A comparison between self-ordering of nanopores in aluminium oxide films achieved by two- and three-step anodic oxidation," Current Applied Physics, vol. 9, pp. S91-S94, 2009.
[33] W. Lee, et al., "Fast fabrication of long-range ordered porous alumina membranes by hard anodization," Nat Mater, vol. 5, pp. 741-747, 2006.
[34] S. Chou, et al., "Imprint of sub 25 nm vias and trenches in polymers," Applied physics letters, vol. 67, p. 3114, 1995.
[35] S. Chou and P. Krauss, "Imprint lithography with sub-10 nm feature size and high throughput," Microelectronic Engineering, vol. 35, pp. 237-240, 1997.
[36] M. Colburn, et al., "Step and flash imprint lithography: a new approach to high-resolution patterning," 1999, pp. 379-389.
[37] D. J. Resnick, et al., "Step & flash imprint lithography," Materials Today, vol. 8, pp. 34-42, 2005.
[38] M. Ojovan, "Viscosity and glass transition in amorphous oxides," Advances in Condensed Matter Physics, vol. 2008, pp. 1-24, 2008.
[39] Y. Hirai, et al., "Fine pattern fabrication on glass surface by imprint lithography," Microelectronic Engineering, vol. 67-68, pp. 237-244, 2003.
[40] J. Wang, et al., "Fabrication of a new broadband waveguide polarizer with a double-layer 190 nm period metal-gratings using nanoimprint lithography," Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 17, p. 2957, 1999.
[41] Z. Yu, et al., "Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithography," Applied physics letters, vol. 77, p. 927, 2000.
[42] M. Li, et al., "Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography," Applied physics letters, vol. 76, p. 673, 2000.
[43] K.-Y. Yang, et al., "Patterning of Ge2Sb2Te5 phase change material using UV nano-imprint lithography," Microelectronic Engineering, vol. 84, pp. 21-24, 2007.
[44] Y. Hirai, et al., "Defect analysis in thermal nanoimprint lithography," Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 21, p. 2765, 2003.
[45] M. Beck, et al., "Improving stamps for 10 nm level wafer scale nanoimprint lithography," Microelectronic Engineering, vol. 61-62, pp. 441-448, 2002.
[46] K. Yee, "Numerical solution of initial boundary value problems involving Maxwell's equations in isotropic media," Antennas and Propagation, IEEE Transactions on, vol. 14, pp. 302-307, 1966.