摘要:
半導體製造業對元件尺寸的要求越來越細小，相對於在製程控制的需求亦越來越精密，因此，批間控制(Run-to-Run，RtR Control)技術便是這樣的需求下而開始發展。目前半導體製造業面臨到一個困境－產品多樣少量的問題，導致於製程產品不太容易控制穩定，特別是少量的產品。
這篇論文中，將介紹批間控制(Run-to-Run Control)相關原理及發表的文獻，並依據工廠實際數據進行製程分析與建模並嚐試重建工廠製程，進一步為了解決上述所提產品多樣少量的問題，我們將嘗試發展一套新的控制策略，Tool＋Product noise-based controller，命名為Mixed Product EWMA (MPEWMA)，其最大的特色便是考慮機台本身造成的干擾(Tool noise)，且運用MATLAB程式語言編輯一套MPEWMA黃光製程模擬控制器。在進行工廠數據模擬控制前，先利用一個雙產品的虛擬製程來進行模擬控制，最後使用工廠機台數據進行批間控制模擬試驗。

Crisalle, O.D., Soper, R.A., Mellichamp, D.A., and Seborg, D.E. "Adaptive Control of Photolithography ","AIChE Journal", Vol.38 No.1, p1-p14, 1992

Del Castillo, E. and Hurwitz, A.M. "Run-to-Run Process Control: Literature Review and Extensions", "Journal of Quality Technology", Vol.29 No.2, p184-p196, 1997

Del Castillo, E. and Yeh, J.Y., "An Adaptive Run-to-Run Optimizing Controller for Linear and Nonlinear Semiconductor Processes", " IEEE Transactions on Semiconductor Manufacturing",Vol.11 No.2,p285-p295, 1998

Edgar, T.F., Butler, S.W., Campbell, W.J., Pfeifer, Bode, C., Hwang, S.B., Balakrisnan, K.S. and Hahn, J. "Automatic Control in Microelectronic Manufacturing: Practices, Challenges, and Possibilities", "Automatica", Vol.36 Issue 11, p1567-p1603, 2000

Gardarelli, G., Palumbo, M., Pelagagge, P.M., "Photolithography Process Modeling Using Neural Networks", "Semiconductor International", p199-p206, 1996

Hershel, R., and Mack, C.A., "Lumped Parameter Model for Optical Lithography," Chap.2, Lithography for VLSI, VLSI Electronics -- Microstructure Science, R.K. Watts and N.G. Einspruch eds., Academic Prss, New York, 1987

Ingolfsson, A., and Sachs, E., "Stability and Sensitivity of an EWMA Controller", "Journal of Quality Technology", Vol.25 No.4, p271-p287, 1993

Moyne, J., Del Castillo, E., Hurwitz, A.M., "Run-to-Run Control in SEMICONDUCTOR MAUNFACTURING", CRC Press LLC, 2001

Sachs, E., Hu, A., Ingolfsson, A., "Run by Run Process Control: Combining SPC and Feedback Control", "IEEE Transactions on Semiconductor Manufacturing", Vol.8 No.1, p26-p43, 1995

Smith, T.H. and Boning, D.S., "A Self-Tuning EWMA Controller Utilizing Artificial Neural Network Function Approximation Techniques", "IEEE Transactions on Components, Packaging, and Manufacturing Technology", Part C, Vol.20 No.2, p121-p132, 1997