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| 研究生： |
鄭景元 C. H. Hsieh |
|---|---|
| 論文名稱： |
應用於監測電漿製程系統中電漿密度之傳輸線式微波干涉儀之研製 Development of Transmission -line Type Microwave Interferometer for Plasma Density Monitoring in Plasma Processing Reactors |
| 指導教授： |
林強
C. Lin 柳克強 K. C. Leou |
| 口試委員: | |
| 學位類別： |
碩士 Master |
| 系所名稱： |
原子科學院 - 工程與系統科學系 Department of Engineering and System Science |
| 論文出版年： | 2006 |
| 畢業學年度： | 94 |
| 語文別： | 中文 |
| 論文頁數： | 102 |
| 中文關鍵詞： | 電漿製程 、感測器 、電漿密度 、同軸傳輸線 、自動校正 |
| 相關次數： | 點閱：1 下載：0 |
| 分享至: |
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在現階段的電漿製程中，由於製程參數無法即時得知，因此，若能夠使用感測器直接反應製程參數的電漿密度，再搭配即時回授控制的技術，就可控制電漿製程中電漿的穩定度，以增加製程之良率。於是本研究承接謝正宏與王瀚廷學長的傳輸線式微波感測器研究，針對量測上的問題加以改進 ，用以更精確量測電漿系統的電漿密度以及其變化情形。
感測器的基本原理是利用當外在環境電漿改變時，同軸傳輸線上微波波長隨之變化的特性，再經由同軸傳輸線在真空與電漿中之色散關係式，即可得到微波相位與電漿密度之間的關係。
研究中使用High Frequency Structure Simulator (HFSS)電磁計算模擬軟體，進行感測器之特性分析以及結構重新設計。重新設計之感測器將圓弧狀傳輸線以直線取代，改善高密度與低密度電漿量測與理論趨勢不符問題；爲避免感測器製作上的差異，進一步利用HFSS來討論重新設計後的感測器尺寸差異對於量測的影響；而量測時基礎相位漂移的問題，則撰寫程式自動校正功能，用以改善當射頻功率輸入時基準相位漂移現象。
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