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研究生: 王羽榛
Wang, Yu-Chen
論文名稱: 微型可調變近紅外光濾波器製作與研究
Design and Fabrication of Tunable MEMS-Based Fabry- Pérot Filter on NIR Wavelength
指導教授: 吳孟奇
Wu, Meng-Chyi
何充隆
Ho, Chong-Long
口試委員: 劉埃森
Ai-Sen Liu
楊智超
Chih-Chao Yang
學位類別: 碩士
Master
系所名稱: 電機資訊學院 - 電子工程研究所
Institute of Electronics Engineering
論文出版年: 2014
畢業學年度: 102
語文別: 英文
論文頁數: 57
中文關鍵詞: 法布立-培若濾波器微機電近紅外光
外文關鍵詞: Fabry-Pérot Filter, MEMS, NIR
相關次數: 點閱:2下載:0
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  • 隨著人類科技文明的進步,手機通訊已成人們生活中無可缺少的必需品,而近年來,樂活養生的風潮興起,人們亦開始注意居住飲食及生活品質。近紅外光在物質檢測上有著相當不錯的鑑別度,藉此,近紅外光檢測可應用於生活環境(如塑膠)及人體(如血糖)檢測上。
    本論文研究以類共振腔的原理,在矽基板上採用微光機電製程技術(MOMES),實現可經由電壓調變波段之近紅外光Fabry-Pérot濾波器(FPF)。此一微型近紅外光濾波器搭配近紅外光感測器,研製可搭載於行動智慧裝置之微型近紅外光檢測模組。
    近紅外光於人體檢測上有相當不錯的準確性,利用此微型可調變近紅外光濾波器結合感測器,可應用於健康照護之生醫領域,將有不錯的效益及經濟價值。


    In recent year, the quality of life draws more and more attention, which people begin to care about details of daily life. On the other hand, with the increase of technology level, the mobile devices like smartphone are easily used in daily life. In addition, the sensor of near-infrared (NIR) wavelength has great accuracy on examined technology. Because of paying more attention to our living days, the NIR detector has an excellent potential to be put in use in our life like plastics test or bioinstrumentation and so on.
    This study describes the design and fabrication of wavelength-tunable MEMS-based band-pass filter on silicon which it changes the air gap by voltage.

    Contents Abstract Ⅰ Acknowledgement Ⅲ Contents Ⅳ List of figures Ⅵ List of Tables Ⅷ Chapter 1 Introduction 1 1.1 Original 1 1.2 Motivation 3 Chapter2 Theory 7 2.1 Basic 7 2.2 Distributed Bragg Reflector 8 2.3 Fabry-Pérot Filter 9 Chapter3 Experimental Method 12 3.1 Simulation and Design 12 3.2 Experimental Method and Process 14 3.3 Measurement System 17 3.3.1 The C-V measurement System 17 3.3.2 The transmittance measurement by Mission Peak Optics 17 3.3.3 The photocurrent measurement by Monochromator 18 Chapter 4 Experiment and Discussion 22 4.1 The Deposition of Distributed Bragg Reflector 22 4.1.1 The Effect of the Deposition Condition 22 4.1.2 The Effect of the Thermal Treatment 24 4.2 The Deposition of Zinc Oxide Thin Film 26 4.2.1 The Deposition of Zinc Oxide Thin Film by RF-Sputter 26 4.2.2 The Effect of Zinc Oxide Thin Film after Thermal Treatment 28 4.3 The Deposition of the Upper Electrode Thin Film 29 4.4 The Wet Etching Process 30 4.5 C-V Measurement 32 4.5.1 Compare the Difference of C-V measurements before and after Etching the Sacrificial Layer 32 4.5.2 The Relationship with Capacitance Variation and Voltage Modulation 33 4.6 The Effect of Tunable range with Bias 37 4.6.1 Transmittance Measurement with Bias by Mission Peak Optics 37 4.6.2 Photocurrent Measurement with Bias by Monochromator 39 Chapter 5 Conclusions and Future Work 54 4.6.1 Conclusions 54 4.6.2 Future Work 54 Reference 56

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