研究生: |
陳政營 Cheng-Ying Chen |
---|---|
論文名稱: |
在氧化鉛與二氧化矽混合膜平面波導上施以熱極化之研究 Study of Thermal Poling on Mixed PbO-SiO2 Planar Waveguide |
指導教授: |
趙 煦
Shiuh Chao |
口試委員: | |
學位類別: |
碩士 Master |
系所名稱: |
電機資訊學院 - 電機工程學系 Department of Electrical Engineering |
論文出版年: | 2005 |
畢業學年度: | 93 |
語文別: | 中文 |
論文頁數: | 99 |
中文關鍵詞: | 氧化鉛與二氧化矽混合膜 、熱極化 |
外文關鍵詞: | PbO-SiO2, thermal poling |
相關次數: | 點閱:3 下載:0 |
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本論文以RF濺鍍系統和氧化鉛靶材在熔融石英玻璃上鍍製薄膜,再經過攝氏650度的熱處理數分鐘。以筆者所查到的文獻得知:(1)鉛氧化物在攝氏550度時,僅存有氧化鉛(PbO)會穩定存在。(2)氧化鉛與二氧化矽在高溫下很容易產生相互擴散(interdiffusion),而形成氧化鉛與二氧化矽共處的玻璃質。利用上述製作方式,筆者成功地在熔融石英玻璃上製作出氧化鉛與二氧化矽混合薄膜。
再利用穿透式光譜儀量測混合薄膜試片之光譜圖,以此光譜圖輸入Essential Macleod薄膜分析軟體計算薄膜折射率與厚度。得知混合膜折射率範圍在1.78426到1.66965之間,薄膜厚度範圍在503.45nm到654.18nm之間。且隨著熱處理時間增加(2.5∼7分鐘),混合膜折射率愈來愈小,厚度愈來愈厚。同樣的試片也以prism coupler進行量測,其混合膜折射率範圍由1.8157降至1.7315,厚度範圍由489.1nm增加至632.2nm。上述結果間接證明,氧化鉛與二氧化矽互相擴散形成混合膜。
將此種方式製作的混合膜以二次離子質譜儀進行縱深分佈分析。發現鍍膜試片確實形成氧化鉛與二樣化矽混合膜,且看出其氧化鉛經由熱處理後的擴散分佈。經由X光薄膜繞射儀量測薄膜繞射圖,發現隨著熱處理時間得增加,薄膜愈趨向非晶形(amorphous)。
將不同熱處理試片以攝氏275度、6kv、30分鐘施以熱極化,再以Maker’s fringe量測S.H.G signal ratio值。與熔融石英玻璃直接施以熱極化的S.H.G signal ratio值比較,其結果無法明確的指出混合膜內是否具有非線性效應。但這不代表薄膜內不具有非線性效應。熱極化混合膜6片(熱處理2.5、3、3.5、4、5.5、6分鐘)試片中,僅發現熱處理3分鐘的試片有非線性衰減的現象。
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