奈米多孔陽極氧化鋁模板具有優異電性、光學和機械結構等特性。本文利用MEMS(Microelectromechanical systems，簡稱MEMS)微加工技術，開發批量化且可重複製作(Reproducible)奈米多孔陽極氧化鋁模板技術，透過多樣基板化的奈米多孔陽極氧化鋁模板，有效發揮奈米多孔模板特性於微元件應用。本文整合奈米多孔陽極氧化鋁模板於各種基板上。開發方法簡述如下：透過兩階段陽極氧化法步驟定義奈米多孔陽極氧化鋁模板於矽、玻璃以及軟性基板，其間利用微奈米加工製程，解決奈米多孔陽極氧化鋁模板與基板附著性的問題，且經過微奈米加工製程佈局，調變奈米多孔模板結構完成具電性、光學、機械結構特性的奈米多孔陽極氧化鋁模板之微元件。利用奈米多孔模板技術整合微奈米加工製程，開發電性、光學、機械結構特性的三項奈米多孔陽極氧化鋁模板之微元件：(1)矽基奈米多孔陽極氧化鋁模板之電容觸碰感測元件。奈米多孔陽極氧化鋁模板增加元件感測面積，提升電容元件效益；其元件的介電特性為7.49且提供0.21%(∆C/μm2)的觸碰感測靈敏度，可有效量測微小生物靜動態觸碰訊號。(2)玻璃基板奈米多孔陽極氧化鋁模板之液晶顯示元件。由奈米多孔陽極氧化鋁模板提供60-80%的光學穿透特性以及液晶垂直配向結構。顯示操作在3Vrms具有32%光學穿透率以及62.5ms的顯示反應時間。(3)軟性基板奈米多孔陽極氧化鋁模板之液晶顯示元件。奈米多孔陽極氧化鋁模板提供光學操作以及機械結構可撓性，其軟性奈米多孔模板提供50-60%光學穿透特性以及撓性液晶垂直配向結構，撓性顯示操作在1.8Vrms具有26%光學穿透率以及18ms的顯示反應時間。 綜合上敘，透過本研究所得之結果與分析可發揮奈米多孔陽極氧化鋁模板技術於微元件設計製作的參考與應用。

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