本篇論文主要分做兩個部分。一部分是非對稱X光共振腔的研究,所謂非對稱共振腔在此是指組成共振腔的前後兩片晶體平板厚度不同的共振腔。此部分的研究主要依據X光動力繞射理論計算的結果。共振腔的材料選為矽晶體,選取原子面(12 4 0)Bragg背向繞射,利用程式模擬X光透過非對稱共振腔會有的共振現象,並與一般對稱共振腔比較,共振腔的非對稱效應會使得共振效應較弱。

另一部分為廣角入射X光波導管水平波導效應之研究。波導管的製作首先使用電子束微影製程技術蝕刻矽晶片(001),再利用熱蒸鍍將金鍍上。實驗上利用表面繞射法使繞射光以適當角度進入矽和金的介面產生全反射,使繞射光在波導管內來回反射傳遞。由於波導管設計為一維波導結構,只有水平方向有來回反射的機會,分析上特別針對水平波導效應進行研究。本實驗藉著表面繞射法首次觀察到廣角入射的X光波導效應。

This thesis dealt with asymmetric X-ray resonators and
X-ray waveguides for wide angle incidence. An aymmetric X-ray resonator is composed of two silicon crystal plates with different thickness used as Bragg reflectors at normal incidence. A study on asymmetric Xray resonators is based on the dynamics theory of X-ray diffraction. With this theory, we have successfully calculated resonance fringes due to crystal cavity resonance. By comparing resonance fringes from symmetric resonators and asymmetric resonators, we find asymmetric resonators have weaker resonance effect than symmetric ones. In the study of X-ray waveguides, X-ray waveguides were prepared from a 4 inches silicon(001) crystal wafer by using the microeletronic lithography and thermal evaporation of gold. If an X-ray enters the interface of silicon and gold at the appropriate incident angle, it will undergo total internal reflection and travel in the waveguide. This is probably that X-ray waveguides for wide incident angle have been realized for the first time by using X-ray surface diffraction scheme.

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