製程參數對D2鋼上濺鍍氮化鈦鍍層之磨耗與機械性質影響研究

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研究生：	邱佳儀 Chiu, Chia-I
論文名稱：	製程參數對D2鋼上濺鍍氮化鈦鍍層之磨耗與機械性質影響研究 Effect of processing parameters on wear resistance and mechanical properties of thick TiN coatings on D2 steel deposited by unbalanced magnetron sputtering
指導教授：	黃嘉宏 Huang, Jia-Hong 喻冀平 Yu, Ge-Ping
口試委員:	李志偉薛富盛
學位類別：	碩士 Master
系所名稱：	原子科學院 - 工程與系統科學系 Department of Engineering and System Science
論文出版年：	2014
畢業學年度：	102
語文別：	英文
論文頁數：	100
中文關鍵詞：	氮化鈦、微米等級、工具鋼、耐磨耗性、非平衡磁控濺鍍系統
相關次數：	點閱：2 下載：0
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本研究的目的為藉由調整製程參數而不使用金屬鈦介層，在D2工具鋼上沉積具有良好機械性質的氮化鈦厚膜。使用非平衡磁控濺鍍系統鍍製，主要控制參數為改變渦輪分子幫浦與鍍膜腔體間閘閥開口大小，以及降低渦輪分子幫浦轉速；為了維持鍍膜過程中固定之工作壓力，以固定比例的方式隨之調整氮氣與氬氣通入的流量。實驗分為三組參數，即全開閥、半開閥、以及降低渦輪分子幫浦轉速。本研究成功在D2工具鋼上鍍覆出膜厚6.5微米且具有良好機械性質的氮化鈦厚膜。研究中的試片氮鈦比例介於1.0-1.1之間，硬度介於23-26GPa之間，不隨厚度而改變。半開閥系列試片之殘留應力稍微隨著厚度上升，但皆保持在約-4.2GPa。進一步分析試片HV510的應力梯度，發現殘留應力在薄膜中的分佈是沿著厚度上下波動，此現象可能致使膜厚成功達到6.5微米，其原因為在鍍膜過程中發生了應力釋放的機制。半開閥以及降轉速系列的殘留應力大多隨厚度減小。當膜厚增加至一定值時，在塗層表面有多面擠壓物產生，而導致殘留應力的降低。然而，這些擠壓物不利於塗層的附著性與耐磨耗性。刮痕測試與磨耗試驗的結果顯示，在所有研究試片中，半開閥試片510具有最佳的耐磨性以及優異的附著力。在半開閥和降轉速的沉積條件下，渦輪分子幫浦的消耗能量比起在全開閥的沉積條件分別降低19%和51%，並且可以延長渦輪分子幫浦的保養期限，不但可以節省能源並可以降低維護的成本，對於塗層工業而言相當有益。

摘要    i
Abstract    ii
致謝    iii
Content    v
List of Tables    xi
Chapter 1 Introduction    1
Chapter 2 Literature Review    2
2.1 Deposition Method    2
2.2 Characteristics of TiN    4
2.3 Effect of Deposition Parameters    7
2.4 The Mechanical Properties of TiN Coatings    9
Chapter 3 Experimental Details    12
3.1 Substrate Preparation    12
3.2 Coating Process    12
3.3 Characterization Methods for Structure and Composition    17
3.3.1 X-Ray Photoelectron Spectroscopy (XPS)    17
3.3.2 Field-Emission Gun Scanning Electron Microscopy (FEG-SEM)    17
3.3.3 X-Ray Diffraction (XRD) and Grazing Incidence XRD (GIXRD)    18
3.3.4 Atomic Force Microscopy (AFM)    19
3.4 Characterization Methods for Properties    19
3.4.1 Hardness    19
3.4.2 Residual Stress: cos2αsin2ψ Method    20
3.4.3 Layer-by-Layer Method    21
3.4.4 Coloration    22
3.4.5 Scratch Test    23
3.4.6 Wear Test    24
Chapter 4 Results    27
4.1 Compositions and Structure    27
4.2 Mechanical properties    43
4.2.1 Hardness    43
4.2.2 Residual stress    43
4.2.3 Stress gradient of HV510    43
4.2.4 Scratch Test    47
4.2.5 Wear Test    51
4.3 Energy Consumption of Turbomolecular Pump    59
Chapter 5 Discussion    60
5.1 Effect of Processing Parameters on the Structure and Mechanical Properties of Thick TiN Coatings    60
5.1.1 Processing parameters for depositing thick TiN coatings    60
5.1.2 Residual stress    65
5.1.3 Adhesion strength    67
5.1.4 Wear rate    68
5.2 Effect of Different Substrates    69
5.3 Energy Saving During Deposition    73
Chapter 6 Conclusions    75
References    76
Appendix A    82
Appendix B    85
Appendix C    89
Appendix D    95
Appendix E    96
Appendix F Calculations about Gas Flow data    100
                                

[1] H. Holleck, "Material selection for hard coatings" Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films 4/6 (1986) 2661.
[2] U.K. Wiiala, I.M. Penttinen, A.S. Korhonen, J. Aromaa, E. Ristolainen, "Improved corrosion-resistance of physical vapor-deposition coated TiN and ZrN" Surface & Coatings Technology 41/2 (1990) 191.
[3] W.D. Sproul, "Very high-rate reactive sputtering of TiN, ZrN and HfN" Thin Solid Films 107/2 (1983) 141.
[4] C.-H.M. J.H.Huang, Haydn Chen, "Ion beam assited deposition of transition-metal nitrides" Handbook of measurement of residual stress 4 (2004) 26.
[5] C.Y. Ting, "TiN formed by evaporation as a diffusion barrier between Al and Si" Journal of Vacuum Science & Technology 21/1 (1982) 14.
[6] V.A. Mernagh, T.C. Kelly, M. Ahern, A.D. Kennedy, A.P.M. Adriaansen, P.P.J. Ramaekers, L. McDonnell, R. Koekoek, "Adhesion improvements in silicon-carbide deposited by plasma enhanced chemical vapor-deposition" Surface & Coatings Technology 49/1-3 (1991) 462.
[7] B.F. Coll, P. Jacquot, "Surface modification of medical implants and surgical devices using TiN layers" Surface & Coatings Technology 36/3-4 (1988) 867.
[8] C.A. Carrasco, V. Vergara, R. Benavente, N. Mingolo, J.C. Rios, "The relationship between residual stress and process parameters in TiN coatings on copper alloy substrates" Materials Characterization 48/1 (2002) 81.
[9] S. PalDey, S.C. Deevi, "Single layer and multilayer wear resistant coatings of (Ti,Al)N: a review" Materials Science and Engineering a-Structural Materials Properties Microstructure and Processing 342/1-2 (2003) 58.
[10] F.Q. Lang, Z.M. Yu, "The corrosion resistance and wear resistance of thick TiN coatings deposited by arc ion plating" Surface & Coatings Technology 145/1-3 (2001) 80.
[11] S.Y. Yoon, J.K. Kim, K.H. Kim, "A comparative study on tribological behavior of TiN and TiAlN coatings prepared by arc ion plating technique" Surface & Coatings Technology 161/2-3 (2002) 237.
[12] C.N. Tai, E.S. Koh, K. Akari, "Macroparticles on TiN films prepared by the arc ion plating process" Surface & Coatings Technology 43-4/1-3 (1990) 324.
[13] M.H. Shiao, F.S. Shieu, "A formation mechanism for the macroparticles in arc ion-plated TiN films" Thin Solid Films 386/1 (2001) 27.
[14] L.K. Sproul WD, "Opportunities for Innovation: Advanced Surface Engineering", Switzerland: Technomic Publishing Co, 1995.
[15] P.J. Kelly, R.D. Arnell, "Magnetron sputtering: a review of recent developments and applications" Vacuum 56/3 (2000) 159.
[16] S.M. Rossbagel, "Sputter Deposition, Opportunities for Innovation", Techonic Publishing Co, 1995.
[17] M. Enomoto, "The N-Ti-V system (nitrogen-titanium-vanadium)" Journal of Phase Equilibria 17/3 (1996) 248.
[18] L.E. Toth, "Transition Metal Carbides and Nitrides", Academic Press, New York, 1971.
[19] J. L.Murray, "Phase Diagram of Binary Titanium Alloys", ASM International, Ohio, 1987.
[20] J. Pelleg, L.Z. Zevin, S. Lungo, N. Croitoru, "Reactive-sputter-deposited TiN films on glass substrates" Thin Solid Films 197/1-2 (1991) 117.
[21] L. Hultman, J.E. Sundgren, J.E. Greene, "Formation of polyhedral N2 bubbles during reactive sputter deposition of epitaxial TiN (100) films" Journal of Applied Physics 66/2 (1989) 536.
[22] H. Ljungcrantz, M. Oden, L. Hultman, J.E. Greene, J.E. Sundgren, "Nanoindentation studies of single-crystal (001)-, (011)-, and (111)-oriented TiN layers on MgO" Journal of Applied Physics 80/12 (1996) 6725.
[23] J.O. Kim, J.D. Achenbach, P.B. Mirkarimi, M. Shinn, S.A. Barnett, "Elastic-constants of single-crystal transition-metal nitride films measured by line-focus acoustic microscopy" Journal of Applied Physics 72/5 (1992) 1805.
[24] K. Yokota, K. Nakamura, T. Kasuya, K. Mukai, M. Ohnishi, "Resistivities of titanium nitride films prepared onto silicon by an ion beam assisted deposition method" Journal of Physics D-Applied Physics 37/7 (2004) 1095.
[25] Y. Tanaka, E. Kim, J. Forster, Z. Xu, "Properties of titanium nitride film deposited by ionized metal plasma source" Journal of Vacuum Science & Technology B 17/2 (1999) 416.
[26] H.O. Pierson, "Handbook of refractory carbides and nitrides: properties, characteristics, processing, and applications", William Andrew, 1996.
[27] A.J.P. E. Török, L. Chollet, W.D. Sproul, "Young's modulus of TiN, TiC, ZrN and HfNX" Thin Solid Films (1987) 153/1.
[28] W.L. Pan, G.P. Yu, J.H. Huang, "Mechanical properties of ion-plated TiN films on AISI D2 steel" Surface & Coatings Technology 110/1-2 (1998) 111.
[29] S. Groudeva-Zotova, R. Kaltofen, T. Sebald, "DC reactive magnetron sputter deposition of (111) textured TiN films - Influence of nitrogen flow and discharge power on the texture formation" Surface & Coatings Technology 127/2-3 (2000) 144.
[30] W.D. Sproul, P.J. Rudnik, C.A. Gogol, "The effect of target power on the nitrogen partiail-pressure level and hardness of reactively sputtered Titanium nitride coatings" Thin Solid Films 171/1 (1989) 171.
[31] J.H. Huang, K.W. Lau, G.P. Yu, "Effect of nitrogen flow rate on structure and properties of nanocrystalline TiN thin films produced by unbalanced magnetron sputtering" Surface & Coatings Technology 191/1 (2005) 17.
[32] L. Combadiere, J. Machet, "Reactive magnetron sputtering deposition of TiN films .1. Influence of the substrate temperature on structure, composition and morphology of the films" Surface & Coatings Technology 88/1-3 (1997) 17.
[33] H.Q. Lou, N. Axen, R.E. Somekh, I.M. Hutchings, "Effect of deposition conditions on the characteristics of reactively sputtered titanium nitride films" Surface & Coatings Technology 90/1-2 (1997) 123.
[34] W.D. Sproul, P.J. Rudnik, M.E. Graham, "The effect of N2 partial-pressure, deposition rate and substrate bias potential on the hardness and texture of reactively sputtered TiN coatings" Surface & Coatings Technology 39/1-3 (1989) 355.
[35] T. Hurkmans, D.B. Lewis, H. Paritong, J.S. Brooks, W.D. Munz, "Influence of ion bombardment on structure and properties of unbalanced magnetron grown CrNx coatings" Surface & Coatings Technology 114/1 (1999) 52.
[36] D. Pilloud, A.S. Dehlinger, J.F. Pierson, A. Roman, L. Pichon, "Reactively sputtered zirconium nitride coatings: structural, mechanical, optical and electrical characteristics" Surface & Coatings Technology 174 (2003) 338.
[37] I. Petrov, L. Hultman, J.E. Sundgren, J.E. Greene, "Polycrystalline TiN films deposited by reactive bias magnetron sputtering - Effects of ion-bombardment on resputtering rates, film composition, and microstructure" Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films 10/2 (1992) 265.
[38] S. Berg, H.O. Blom, T. Larsson, C. Nender, "Modeling of reactive sputtering of compound materials" Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films 5/2 (1987) 202.
[39] S. Berg, T. Nyberg, "Fundamental understanding and modeling of reactive sputtering processes" Thin Solid Films 476/2 (2005) 215.
[40] P.A. Steinmann, Y. Tardy, H.E. Hintermann, "Adhesion testing by the scratch test method - the influence of intrinsic and extrinsic parameters on the critical load" Thin Solid Films 154/1-2 (1987) 333.
[41] P.J. Burnett, D.S. Rickerby, "The relationship between hardness and scratch adhesion" Thin Solid Films 154/1-2 (1987) 403.
[42] J. Takadoum, H.H. Bennani, "Influence of substrate roughness and coating thickness on adhesion, friction and wear TiN films" Surface & Coatings Technology 96/2-3 (1997) 272.
[43] B. Hammer, A.J. Perry, P. Laeng, P.A. Steinmann, "The scratch test adhesion of TiC deposited industrially by chemical vapor-deposition on steel" Thin Solid Films 96/1 (1982) 45.
[44] A.J. Perry, "Adhesion studies of ion-plated TiN on steel" Thin Solid Films 81/4 (1981) 357.
[45] O. Knotek, R. Elsing, G. Kramer, F. Jungblut, "On the origin of compressive stress in PVD coatings - an explicative model" Surface & Coatings Technology 46/3 (1991) 265.
[46] Y.Z. Lee, K.H. Jeong, "Wear-life diagram of TiN-coated steels" Wear 217/2 (1998) 175.
[47] S.J. Bull, D.S. Rickerby, A. Jain, "The sliding wear of Titanium nitride coatings" Surface & Coatings Technology 41/3 (1990) 269.
[48] S. Wilson, A.T. Alpas, "Dry sliding wear of a PVD TiN coating against Si3N4 at elevated temperatures" Surface & Coatings Technology 86/1-3 (1996) 75.
[49] J.R. Jiang, R.D. Arnell, "The effect of substrate surface roughness on the wear of DLC coatings" Wear 239/1 (2000) 1.
[50] I.P. Hayward, I.L. Singer, L.E. Seitzman, "Effect of roughness on the friction of diamond on CVD diamond coatings" Wear 157/2 (1992) 215.
[51] D.A. Shirley, "High-Resolution X-Ray Photoemission Spectrum of the Valence Bands of Gold" Phys. Rev B 5 (1972) 4709.
[52] G.N. P. Scherrer, Mathematisch-Physikalische Klasse 2 (1918) 98~100.
[53] M.J.B. L.V. Azaroff, "The powder method in X-ray crystallography McGraw-Hill" (1958) 233.
[54] W.C. Oliver, G.M. Pharr, "An improved technique for determining hardness and elastic-modulus using load and displacement sensing indentation experiments" Journal of Materials Research 7/6 (1992) 1564.
[55] C.H. Ma, J.H. Huang, H. Chen, "Residual stress measurement in textured thin film by grazing-incidence X-ray diffraction" Thin Solid Films 418/2 (2002) 73.
[56] B.B. He, "Two-dimensional x-ray diffraction" Wiley (2009).
[57] C.L.A. Ricardo, M. D'Incau, P. Scardi, "Revision and extension of the standard laboratory technique for X-ray diffraction measurement of residual stress gradients" Journal of Applied Crystallography 40 (2007) 675.
[58] J.V. J. Koo, in: A.J. Bottger, R. Delhez, E.J. Mittemeijer (Eds.), Proceedings of the Fifth European Conference on Residual Stresses, Trans Tech Publications Ltd, Zurich-Uetikon, 2000, p. 89.
[59] I. Kraus, G. Gosmanova, "On X-ray measurements of residual-stresses in materials with lattice strain gradient" Czechoslovak Journal of Physics 39/7 (1989) 751.
[60] B.K. V. Hauk, in: A.J. Bottger, R. Delhez, E.J. Mittemeijer, Proceedings of the Fifth European Conference on Residual Stresses, Trans Tech Publications Ltd, Zurich-Uetikon, 2000, p. 80.
[61] J.P. H.K. Tonshoff, H. Seegers, in: A.J. Bottger, R. Delhez, E.J. Mittemeijer, Proceedings of the Fifth European Conference on Residual Stresses, vol. 347-3, Trans Tech Publications Ltd, Zurich-Uetikon, 2000, p. 83.
[62] A.J. Perry, V. Valvoda, D. Rafaja, "X-ray residual-stress measurement in TiN, ZrN and HfN films using the seemann-Bohlin method" Thin Solid Films 214/2 (1992) 169.
[63] A.J. Perry, J.A. Sue, P.J. Martin, "Practical measurement of the residual stress in coatings" Surface & Coatings Technology 81/1 (1996) 17.
[64] "CIE, Tech. Rept., vol. Tech. Rept., Bureau Central de la CIE, 1971, p. 1".
[65] "CIE, Tech. Rept., vol. Tech. Rept., Bureau Central de la CIE,1978".
[66] "ASTM, Symposium on Color, Americam Society for Testing Materials, 1941, pp. 3.".
[67] S. Zhang, D. Sun, Y.Q. Fu, H.J. Du, "Effect of sputtering target power on microstructure and mechanical properties of nanocomposite nc-TiN/a-SiNx thin films" Thin Solid Films 447 (2004) 462.
[68] "JCPDS pdf #350753".
[69] B.J. Burrow, A.E. Morgan, R.C. Ellwanger, "A correlation of auger-electron spectroscopy, X-ray photoelectron-spectroscopy, and rutherford backscattering spectrometry measurements on sputter-deposited Titanium nitride thin-films" Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films 4/6 (1986) 2463.
[70] M.J. Vasile, A.B. Emerson, F.A. Baiocchi, "THE CHARACTERIZATION OF TITANIUM NITRIDE BY X-RAY PHOTOELECTRON-SPECTROSCOPY AND RUTHERFORD BACKSCATTERING" Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films 8/1 (1990) 99.
[71] N.C. Saha, H.G. Tompkins, "Titanium nitride oxidation chemistry - An X-ray photoelectron-spectroscopy study" Journal of Applied Physics 72/7 (1992) 3072.
[72] W. Dianis, J.E. Lester, "Study of nitric-oxide adsorbed on nickel-oxide, cobalt oxide, and graphite by X-ray photoelectron-spectroscopy" Surface Science 43/2 (1974) 602.
[73] L. Wicikowski, B. Kusz, L. Murawski, K. Szaniawska, B. Susla, "AFM and XPS study of nitrided TiO2 and SiO2-TiO2 sol-gel derived films" Vacuum 54/1-4 (1999) 221.
[74] J. Pouilleau, D. Devilliers, F. Garrido, S. DurandVidal, "Structure and composition of passive titanium oxide films" Materials Science and Engineering B-Solid State Materials for Advanced Technology 47/3 (1997) 235.
[75] J. Halbritter, H. Leiste, H.J. Mathes, P. Walk, "ARXPS - Studies of nucleation and make-up of sputtered TiN-layers" Fresenius Journal of Analytical Chemistry 341/5-6 (1991) 320.
[76] J.H. Huang, F.Y. Ouyang, G.P. Yu, "Effect of film thickness and Ti interlayer on the structure and properties of nanocrystalline TiN thin films on AISI D2 steel" Surface & Coatings Technology 201/16-17 (2007) 7043.
[77] J.A. Sue, H.H. Troue, "Friction and wear properties of Titanium nitride coating in sliding contact with AISI 01 steel" Surface & Coatings Technology 43-4/1-3 (1990) 709.
[78] Y.Y. Guu, J.F. Lin, C.F. Ai, "The tribological characteristics of titanium nitride, titanium carbonitride and titanium carbide coatings" Thin Solid Films 302/1-2 (1997) 193.
[79] A.H. Liu, J.X. Deng, H.B. Cui, Y.Y. Chen, J. Zhao, "Friction and wear properties of TiN, TiAIN, AlTiN and CrAlN PVD nitride coatings" International Journal of Refractory Metals & Hard Materials 31 (2012) 82.
[80] G.-P.Y. Ming-Lun Cai, Jia-Hong Huang, National Tsing-Hua University, Hsinchu, Taiwan, 2013.
[81] S.S. Zhao, Y. Yang, J.B. Li, J. Gong, C. Sun, "Effect of deposition processes on residual stress profiles along the thickness in (Ti,Al)N films" Surface & Coatings Technology 202/21 (2008) 5185.
[82] H. Oettel, R. Wiedemann, S. Preissler, "Residual-stresses in nitride hard coatings prepared by magnetron sputtering and arc evaporation" Surface & Coatings Technology 74-5/1-3 (1995) 273.
[83] H. Watanabe, N. Yamada, M. Okaji, "Linear thermal expansion coefficient of silicon from 293 to 1000 K" International Journal of Thermophysics 25/1 (2004) 221.
[84] K.K.N. S.M. Sze, "Physics of semiconductor devices", John Wiley & Sons Ltd, New Jersey, USA, 2006.
[85] N.J.M. Carvalho, E. Zoestbergen, B.J. Kooi, J.T.M. De Hosson, "Stress analysis and microstructure of PVD monolayer TiN and multilayer TiN/(Ti,Al)N coatings" Thin Solid Films 429/1-2 (2003) 179.

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