多孔矽蝕刻製成具有光子晶體結構之高靈敏度重金屬檢測器

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研究生：	賴建任 Lai, Jian Ren
論文名稱：	多孔矽蝕刻製成具有光子晶體結構之高靈敏度重金屬檢測器 Porous Silicon Based Photonic-Sensor for High Sensitive Heavy Metal Ion Detecrtion.
指導教授：	王本誠 Wang, Pen Cheng 曾繁根 Tseng, Fan Gang
口試委員:	魏培坤 Wei, Pei Kuen 林凡異 Lin, Fan Yi
學位類別：	碩士 Master
系所名稱：	原子科學院 - 工程與系統科學系 Department of Engineering and System Science
論文出版年：	2015
畢業學年度：	103
語文別：	中文
論文頁數：	84
中文關鍵詞：	傅立葉紅外光譜儀、多孔矽蝕刻、重金屬檢測、光子晶體
外文關鍵詞：	FTIR, Porous silicon etching, heavy metal ion detection, photonic crystal
相關次數：	點閱：3 下載：0
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水為人類生活中不可或缺的物質,人們生活的聚落大多依靠著水源區而成長。人類的社會不斷的進步從最初的農業社會經過工業革命直到現在,隨著工業與科技的成長人們過著比以往相對富裕的生活。但在工業的蓬勃發展也伴隨著許多環境汙染的產生，例如二氧化碳造成全球暖化、工業排放廢水造成各種形式的水汙染等等。這都漸漸的傷害著我們居住的環境。
在水汙染中的重金屬汙染在70~80年代更是打擊台灣的相關農漁牧業，如砷、鎘、汞、鉛等重金屬汙染。有鑑於此，在本研究目的為製造相關重金屬在水汙染的檢測機制。目前的檢測機制大多利用較昂貴的儀器設備或是利用步驟繁複的化學滴定方式來進行水溶液中的重金屬分析。在本實驗中第一代晶片具有一維光子晶體特性並利用簡便的化學合成及表面修飾使其在傅立葉紅外線光譜儀(FTIR)有檢測重金屬的訊號，並且達到定性與定量的效果。第二代晶片為可見光波段之光子晶體搭配電化學還原將待測金屬離子直接在多孔矽孔洞中析出造成較大的折射率改變，達到增強訊號強度與檢測極限之效果。

Water is essential to human life material, settlement of people's lives as much dependent on the water area and growth. Human society continues to progress from the first agricultural society through the industrial revolution until now, people with the growth of industry and technology have had a relatively affluent life than ever before. But in the booming industry it has been accompanied by a number of environmental pollution produced, such as carbon dioxide cause global warming caused by industrial waste water in various forms of water pollution and so on. This will gradually hurting the environment we live.
The heavy metal pollution in water pollution in 70 to 80 years is relevant agricultural, fishery and animal husbandry against Taiwan, such as arsenic, cadmium, mercury, lead and heavy metal pollution. In view of this, the aim of this study is related to the manufacture of heavy metals in water pollution detection mechanism. The current detection mechanism mostly use the more expensive equipment or the use of complex chemical titration step approach to the analysis of heavy metals in aqueous solution. In this experiment, the first generation of wafer-dimensional photonic crystal having a characteristic and by a simple chemical synthesis and surface modification of it in Fourier infrared spectroscopy (FTIR) for detecting signals of heavy metals, and to achieve qualitative and quantitative results. The second generation of photonic crystal wafer as visible light with a wavelength of electrochemical reduction of metal ions to be measured directly in the porous silicon precipitates hole caused large refractive index change, to enhance the signal strength and the detection limit of the effect.
The first two chapters illustrate the application of this study motive and related experiments. Today introduced the relevant heavy metal detection equipment, introduces the basic principles of photonic crystals with porous silicon etching works. The third and fourth chapters compared with experimental design processes and related process steps. Fifth and sixth chapters, compared with results of the discussions and conclusions. Literature review is included in Chapter VII.

致謝    i
摘要    ii
Abstract    iii
總目錄    v
圖目錄    ix
表目錄    xiii
第一章 緒論    1
1 前言    1
2 研究動機    3
第二章 文獻回顧    4
1傅立葉轉換紅外光譜儀介紹[5]    4
1.1 傅立葉紅外線光譜儀基本原理    5
1.2 傅立葉紅外光譜儀偵測方式    6
2光子晶體原理與介紹    8
2.1光子晶體簡介    8
2.2光子晶體與能隙    10
2.3含缺陷一維光子晶體的結構與光譜特性    11
3 重金屬檢測方式    14
3.1 質譜儀(Mass Spectrometry)[12]    14
3.2原子吸收光譜(atomic absorption spectroscopy)    15
3.3 高效能液相層析儀(HPLC)    15
4 多孔隙蝕刻原理簡介    17
4.1 電化學蝕刻原理    17
4.2 矽溶解反應    18
4.3 多孔矽形成機制    20
4.4多孔矽蝕刻建構光子晶體應用    22
5光學感測器之應用    27
5-1 傳統干涉式生醫感測器    27
5-2 紅外光波段光子晶體應用    32
第三章 實驗設計與方法    34
1實驗流程設計與架構    34
2第一代紅外光波段光子晶體的製程與檢測方式    34
2.1 多孔矽蝕刻建構光子晶體結構    34
2.1單層多孔矽蝕刻    36
2.2多層多孔矽蝕刻與週期性結構光子晶體製成    36
2.3光譜隨溶液濃度改變而產生紅位移(red shift)    37
2.4  EDTA與重金屬螯合產生而產生特徵峰改變    37
3 第二代可見光波段光子晶體製程與檢測方式    38
3.1 多孔隙蝕刻建構光子晶體結構    38
3.2 量測方式    38
3.2 多孔矽層之表面處理    39
4 實驗材料與儀器    39
4.1實驗儀器    39
第四章 實驗步驟    41
1 第一代晶片:多孔矽蝕刻建構紅外光波段光子晶體結構    41
1.1 單層多孔矽蝕刻    41
1.2多層多孔矽與光子晶體結構蝕刻    42
1.3多孔矽表面犧牲層去除    43
2表面處理    43
2.1 表面熱氧化    46
2.2 試片清潔    46
2.3硫酸親水處理與氧電漿親水處理    46
2.4試片表面氨基修飾    47
2.5    EDTA表面接合    47
3傅立葉紅外線光譜儀檢測與比較    48
3.1光學系統    48
3.2樣品分析    48
4第二代晶片: 多孔矽蝕刻建構可見光波段光子晶體結構    50
4.1晶片結構設定與預處理    50
4.2可見光光子晶體基本效能測試    52
第五章 結果與討論    53
1多孔矽蝕刻建構光子晶體結構    53
1.1單層多孔隙蝕刻    53
1.2多層多孔隙蝕刻與光子晶體製程    54
1.3多孔隙表面犧牲層去除    57
2表面處理    58
2.1熱氧化處理    58
2.2晶片親水與表面修飾    59
3    第一代紅外光波段分析結果    60
3.1 光子晶體晶片紅外光譜比較    60
3.2濕式檢測結果    63
3.3乾式分析結果    65
4    第二代可見光波段分析結果    67
4.1    多孔矽蝕刻參數確認    67
4.2    多孔矽層折射率分析    68
4.3    可見光光子晶體建構    71
4.4    可見光光子晶體效能測試    77
第六章 結論    81
第七章 未來工作    82
第八章 參考文獻    83


                                

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