使用無電極電鍍(electroless plating)的方法在基材表面上沉積的還原金屬團可以達到奈米尺寸大小，雖然無電極電鍍的氧化還原機制的詳細過程仍因為不同的系統而異。 本實驗是利用原子力顯微鏡(atomic force microscopy, AFM)來研究還原沉積的金屬鎳原子團在矽表面的密度與高度，並嘗詴在這些鎳金屬團成長奈米碳管。我們發現硫酸鎳(NiSO4〃6H2O)電鍍溶液的不穩定性；還更氫氟酸(HF)對氧化還原的機制的影響；在特定濃度的硫酸鎳溶液中鎳短時間內向上堆疊最高的時間為特定值；在碳化沉積鎳在Si(100)表面時，大部分的碳化條件無法成長垂直表面的碳管。

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