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研究生: 葛振廷
Cheng-Ting Ko
論文名稱: 微型心血管壓力感測器之設計與製作
Design and Fabrication of An Ultra Miniature Pressure Sensor in Conventional CMOS For a Cardiovascular Catheter
指導教授: 盧向成
Michael S.-C. Lu
Shiang-Cheng Lu
口試委員:
學位類別: 碩士
Master
系所名稱: 電機資訊學院 - 電子工程研究所
Institute of Electronics Engineering
論文出版年: 2005
畢業學年度: 93
語文別: 中文
論文頁數: 78
中文關鍵詞: 心血管手術生醫晶片微機電系統壓力感測器震盪器電路互補式金氧半微機電製程
外文關鍵詞: Balloon angioplasty, biochips, MEMS, Pressure sensor, RC-Oscillator circuit, CMOS MEMS
相關次數: 點閱:3下載:0
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  • 我們用互補式金氧半微機電(CMOS MEMS)製程來設計一個整合式的壓力感測器,預期會用在心血管手術中的血壓量測上。由於需要很小尺寸的元件,所以預期上感測度不會太高。我們使用一個電容式感測電路把壓力引起的電容值變化轉換成震盪器的頻率變化。完成互補式金氧半製程後,接著的後製程會把生醫相容的高分子聚合物沉積在薄膜的上方,而利用犧牲層金屬蝕刻可以釋放在高分子聚合物下的微機械結構薄膜,在某些設計上震盪器感測電路可以直接放在結構薄膜的下面,如此一來又可以節省面積。我們目前的設計量測出來可達到421 kHz/fF的感測度。


    We propose the use of CMOS-MEMS technology to fabricate a monolithically integrated pressure sensor intended for blood pressure monitoring during balloon angioplasty. Due to the small device size, a low sensitivity is expected. We employ a capacitive sensing circuit to convert the pressure-induced capacitive change to a shift of the oscillation frequency. The post-fabrication steps after completion of the CMOS include the use of a bio-compatible Parylene coating on top of the membrane, and a sacrificial metal etch to release the micromechanical membrane underneath the Parylene. In some design the readout circuit is a CMOS oscillator which can be placed directly underneath the membrane to save chip area. Our current design shows a sensitivity of 421 kHz/fF.

    第一章-序論 ………………………………………………………….………1 1.1 微機電系統概論……………………………………. .…….……1 1.2 壓力感測器簡介…………………………………… . .…….……2 1.3 壓力感測器設計動機及文獻回顧…………………… .….……5 第二章-電容式壓力感測器架構……………………………………………10 2.1 壓力感測系統之概述………………………….………………10 2.2 感測器機械結構之設計與模擬……………. ..………. ………11 2.2.1 兩套後製程流程概述………………… .…..………13 2.2.2 方形設計概念及模擬……………… ……..….……19 2.2.2.1 蛇狀懸臂樑的彈性係數 數學公式推導………………….. .……20 2.2.2.2 方形結構電容值計算………… ……..…24 2.2.2.3 方形結構的有限元素模擬…………..…26 2.2.3 圓形設計概念及模擬……………………….. ….…28 2.2.3.1 圓形結構電容值計算…………. ….……29 2.2.3.2 圓形結構的有限元素模擬…………. …29 2.3 CMOS振盪器感測電路之設計與模擬…………………….…31 2.3.1 CMOS振盪器原理………….……………...…….…32 2.3.2 考量結構下極版寄生電容效應 (Faulty Voltage Effect)…………………………33 2.3.3 CMOS振盪器改良……………………...……..……34 2.3.4 Hspice電路模擬…………….………………….……35 2.4 規格表及整體晶片圖………………………………….………37 第三章-薄膜結構製作與後製程處理………….………………………...…39 3.1 第一種後製程實驗:利用passivation當蝕刻抵擋層…….…39 3.1.1 溼蝕刻(Wet etching)………………………….…39 3.1.2 乾蝕刻(RIE)………………………………..……38 3.1.3 打線(Bonding wire)…………………………..…43 3.1.4 電子顯微鏡(SEM)結果圖………….…44 3.2.1 第二種後製程實驗:利用parylene當蝕刻抵擋層… …...…45 3.2.1 高分子Parylene薄膜沉積……………… …….....…45 3.2.2 黃光微影………………………………… ……....…47 3.2.3 雷射切割機(Laser cutter)………………….……49 3.2.4 溼蝕刻…………………………………….…..…..…50 第四章-量測結果分析及討論………………………………………………51 4.1 結構體量測使用alpha step………………………… ……....…51 4.2 測試電路量測……………………………………….…………53 4.3 Spectrum Analysis量測…………………………….…….……55 4.4 Nano indenter量測…………………………….…….…………56 4.5 壓電制動器量測…………………………………….…………57 第五章-討論……………………………………………… ……….………61 5.1 嘗試和創新…………………………………… ………..……61 5.2 未完之處-封裝……………………………………… ..……62 5.3 於tactile sensor之應用………………………………………63 5.4 於Voltage Control Oscillator之應用…………………………64 第六章-結論……………………………………………………………….…69

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