在過去，我們以角解析光電子能譜對ClAlPc蒸鍍於Ag(111)薄膜、Ag(111)單晶、Au(111)單晶上已經有所研究。經由控制蒸鍍ClAlPc的速率，我們可以控制在基底上呈現氯向上或氯向下的排列方式。在這三種不同的基底上，使用慢速率蒸鍍時，將會產生以氯向下的排列方式，但穩定性皆有所不同。除此之外，在這三種不同的基底上分子能量狀態的能量位置以及功函數也皆有所不同。
將ClAlPc蒸鍍於Ag(111)單晶與Ag(111)薄膜上，經過比較後我們發現將ClAlPc蒸鍍於Ag(111)薄膜上時會比蒸鍍於Ag(111)單晶上還要穩定，同時相對應的功函數也上升的較多，除此之外，銀原子將電子轉移給氯原子的數量也比蒸鍍於Ag(111)單晶上還要多。主要原因為在下層的Ge(111)的基底會有一個應力效應(strain effect)對銀薄膜產生作用，因此銀原子之間的空隙會被拉大，進而讓ClAlPc且呈現氯向下的氯原子能夠更加容易且穩定的固定在銀薄膜表面。
當我們將ClAlPc蒸鍍於Ag(111)單晶與Au(111)單晶上時，透過比較我們發現功函數呈現相反的變化，主要是因為ClAlPc的功函數比銀高，但是比金還要低，恰好介於兩者之間。當ClAlPc以氯向下排列於Au(111)單晶以及Ag(111)單晶表面時，皆為相當的不穩定，容易受到光照效應而對分子能量狀態的強度產生改變，但是當ClAlPc蒸鍍於Ag(111)單晶表面時會比蒸鍍於Ag(111)單晶表面來的穩定。

We studied ClAlPc adsorbed on the Ag thin films, Ag(111) and Au(111) crystals using angle-resolved photoelectron spectroscopy (ARPES). By adjusting the deposition rate, the adsorption configuration of ClAlPc, Cl-up or Cl-down, can be manipulated. For all these three substrates, the slow deposition rate of ClAlPc can lead to a dominant Cl-down configuration; however, the robustness of such a configuration is different. In addition, the energy positions of molecular energy states (MES) as well as the work function change are also different for these three cases.
By comparing the cases of ClAlPc adsorbed on the Ag(111) thin films and crystal, we found that ClAlPc in Cl-down configuration is more stable on Ag(111) thin films and the corresponding more increase of work function indicates more charge transfer to Cl from Ag. This is ascribed to the large strain effect on Ag thin films from the underlying Ge(111) substrate; the size of hollow sites between Ag atoms is thus enlarged to facilitate the stable anchoring of Cl atom of ClAlPc in Cl-down configuration.
As for the comparison between ClAlPc adsorbed on Ag(111) and Au(111) crystals, the work functions shift in opposite directions upon deposition due to the higher (lower) work-function value of Au (Ag) than that of ClAlPc. The ClAlPc in Cl-down configuration on Au(111) is also unstable according to the photon irradiation dependence of the MES peak intensity but relatively more stable than ClAlPc on Ag(111) crystal.

[１] Ching-Hung Chen, Study of the Interfacial Structure between CuPc thin films and the uniform Ag thin films by Angle-resolved Photoemission Spectroscopy, Master thesis, National Tsing Hua University (2011)
[２] S.-J. Tang, W.-K. Chang, Y.-M. Chiu, H.-Y. Chen, C.-M. Cheng, K.-D. Tsuei, T. Miller, and T.-C. Chiang, Phys. Rev. B 78, 245407 (2008)
[３] Kai-Jun Su, Manipulation of interfacial dipole by polarorganic molecular, Unpublished, Master's thesis, National Tsing Hua University
[４] H. Ishii, K. Sugiyama, E. Ito, and K. Seki, Adv. Mater. 11, 605 (1999)
[５] F. Latteyer, H. Peisert, U. Aygül, I. Biswas, F. Petraki, T. Basova, A. Vollmer,and T. Chassé, J. Phys. Chem. C 115, 11657 (2011)
[６] H. Fukagawa, S. Hosoumi, H. Yamane, S. Kera, and N. Ueno, Phys. Rev. B 83, 085304 (2011)
[７] Y. L. Huang, W. Chen, F. Bussolotti, T. C. Niu, A. T. S. Wee, N. Ueno, and S. Kera, Phys. Rev. B 87, 085205 (2013)
[８] Ying-Chieh Chuang ,Comparison between As-grown and Annealing Methods on the Structures of Polar-Phthalocyanine grown on the Uniform Silver Thin Films ,Master thesis, National Tsing Hua University (2014)
[９] Hans Lüth, Surface and interface of solids Materials, 3rd edition (Springer,1995)
[１０] Chin-Yung Wang, Study of interfacial structure for thin films of TTC on uniform silver thin films by ARPES, Master thesis, National Tsing Hua University (2012)
[１１] RADAK Furnance Installation and Operation Instructions
[１２] S. Hüfner, Photoelectron Spectroscopy, 3 rd edition (Springer, 2003)
[１３] Andrea Damascelli, Phys. Scr. T109, 61-74 (2004)
[１４] M. P. Seah, and W. A. Dench, Surf. Interface Anal. 1, 2 (1979)
[１５] User Manual SCIENTA R3000, VG SCUENTA
[１６] Mary Hope Upton, Photoemission Studies of the Electron Structures and Properties of Thin Lead Films, Ph.D. thesis, University of Illinois at Urbana-Champaign (2005)
[１７] www.nsrrc.org.tw
[１８] S.-J. Tang, W.-K. Chang, Y.-M. Chiu, H.-Y. Chen, C.-M. Cheng, K.-D. Tsuei, T. Miller, and T.-C. Chiang, Phys. Rev. B 78, 245407 (2008)
[１９] Rudy Schlaf, Calibration of Photoemission Spectra and Work Function Determination (2014)
[２０] M.-K. Lin, Y. Nakayama, Y.-J. Zhuang, K.-J. Su, C.-Y. Wang, T.-W. Pi, S. Metz, T. A. Papadopoulos, T.-C. Chiang, H. Ishii, and S.-J. Tang, Phys. Rev. B 95, 085425 (2017)
[２１] Y. L. Huang, W. Chen, F. Bussolotti, T. C. Niu, A. T. S. Wee, N. Ueno, and S. Kera, Phys. Rev. B 87, 085205 (2013)
[２２] S.-J. Tang, C.-Y. Lee, C.-C. Huang, T.-R. Chang, C.-M. Cheng, K.-D. Tsuei, H.-T. Jeng, V. Yeh, and T.-C. Chiang, Phys. Rev. Lett. 107, 066802 (2011)
[２３] I. Kröger, B. Stadtmüller, C. Stadler, J. Ziroff, M. Kochler, A. Stahl, F. Pollinger, T.-L. Lee, J. Zegenhagen, F. Reinert and C. Kumpf, New J. Phys. 12, 083038 (2010)