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研究生: 陳志豪
Chen, Chihhao
論文名稱: 超快電子槍的機構設計
The Design and Manufacture of Ultrafast Electron Gun
指導教授: 陳福榮
Chen, Furong
口試委員: 殷廣鈐
Yin, Gungchian
薛富盛
Shieu, Fusheng
劉全璞
Liu, Chuanpu
學位類別: 碩士
Master
系所名稱: 原子科學院 - 工程與系統科學系
Department of Engineering and System Science
論文出版年: 2012
畢業學年度: 101
語文別: 中文
論文頁數: 80
中文關鍵詞: 電子顯微鏡超快電子光學
外文關鍵詞: TEM, ultrafast
相關次數: 點閱:3下載:0
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  • 電子顯微鏡已經成為包括材料、化學、生物等各領域不可或缺的一項重要研究工具,
    但隨著各領域需求的增加,原本電子顯微鏡做了更多的改良,4D電子顯微鏡就此產生,
    4D電子顯微鏡不只擁有原本電子顯微鏡的高空間解析度的特性,我們藉著只包含少數電
    子的波包,避開了電子間彼此干擾的space charge effect與Boerch effect,空間解析度也被
    提高至更高等級,也就是說4D電子顯微鏡可以同時提高空間與時間的解析度,以及加入
    了超快雷射,使原本的熱陰極電子顯微鏡加入了雷射的光激發效果,讓電子束被拉出,超
    快雷射的輸出頻率亦是控制時間解析度的一項因素。
    超快電子顯微鏡又稱四維度電子顯微鏡,由於跟傳統電子顯微鏡相較之下,提高了時
    間解析度,我們可以觀察到更短暫時間內的變化,且預期將它廣泛的應用於材料學上細部
    短暫動態變化的觀察,或化學反應中間過程的變化觀察,甚至對未來在醫學上的研究都是一大
    利多。
    在本論文中,我們首先設計出想要的機構,包括電子槍、透鏡部分、電子偏極板、奈
    米等級以上的超快開關(photo-switch)、及接收電子訊號部分。燈絲被加熱與超快雷射的共
    同作用之下,電子束被激發出來,經過了聚焦鏡的聚焦,再經由被photo-switch所控制的
    偏轉器的偏轉,使電子束最後打在MCP上訊號被放大,我們預期在加入超快雷射前後會看
    到電流值的大小變化,以證明超快雷射實際上有幫助電子束出現。


    Electron microscope has become a pivotal instrument in materials, chemical, and biological
    field. But now, we use the single-electron packets to develop 4D ultrafast electron microscope, that
    the 4D-EM not only held the function of conventional EM, but also provides the structural of dyn-
    amic image and combined with spatial and temporal resolution . Because single-electron packets
    have no space- charge effect,and Boerch effect images patterns can observe with atomic- scale spat-
    ial resolution, and temporal resoluyion that is determined by the ultrafast laser pulses duration can
    achieve pico- or femtosecond scale.
    We also call ultrafast electron microscope as 4D electron microscope,because it improve more temporal resolution than conventional electron microscope,and we can observe the transient chan-
    ge。We hope that we will apply in materials science、chemical reaction or even in research of me-
    dical science。
    In the research we design the electron gun chamber, deflection plate, sub-nanosecond electron switch and combined with MCP. Electrons are exciting from probe by ultrafast laser and focus on
    the specimen to produce electron signal. The electron signal deflects by adding electron field that is controlled by electron-optic switch in few picosecond and produce dispersion to separate the signal.
    The final signal is amplified when goes through MCP (multi channel plate) , and detected by phos-
    phor screen. We expect the current will increase by adding ultrafast laser. It will verify that ultrafast
    laser change the current of electron beam.

    摘要 I Abstract II 致謝 III 總目錄 V 圖目錄 VII 表目錄 XI 第一章 緒論 1 1-1前言 1 1-2超快電子光學 2 1-3空間與時間解析度 4 1-3-1空間解析度(Spatial resolution)[1,3] 4 1-3-2時間解析度(Temporal resolution)[1,3] 5 1-4研究動機 8 第二章 文獻回顧 10 2-1超快雷射所造成的影響 11 2-2 4D ultrafast electron microscopy in EELS 14 2-3Ultrafast Electron Diffraction 17 2-4 Ultrafast electron crystallography(UEC) 23 2-5超快電子光學技術的其他應用 28 第三章 定理 30 3-1空間電荷效應 與 Boersch effect 30 3-1-1Space charge effect[1,3] 30 3-1-2Boersch effect[3] 31 3-2超快電子顯微鏡的機制 33 3-2-1雷射引發場發射機制[27,28,29] 33 3-2-2雷射引發熱場發機制[32,33,34,35] 37 第四章 機構設計 40 4-1結構基本介紹 40 4-2超快雷射(ultrafast laser) 44 4-3電子槍(electron gun) 46 4-4聚焦鏡(condenser lens) 49 4-5偵測器(detector) 50 4-6photo-switch 55 4-7MCP(micro-channel plate)&phosphor screen 57 第五章 實驗結果與討論 59 5-1光學模擬分析 59 5-2photo-switch的測試 61 5-3電子槍出光初步測試 64 5-4超快電子槍體結合超快雷射 67 5-5討論 71 5-5-1實驗結果的討論 71 5-5-2機台的改良 72 5-5-3校正的改良 73 5-5-4偵測的改良 75 5-6總結 75 參考資料 76

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