本研究論文主要是以溶膠凝膠法(sol-gel method)製備二氧化矽粒子在相同的實驗操作條件下，加入大量的氨水揮發作為系統干擾並探討以批間控制(Run to run control)的方法使用同一套設備及以批間控制器調整實驗配方製備不同規格之二氧化矽粒徑的大小(size)並獲得穩定的控制且達到設定的目標值。
同時，我們也應用了前人所建立的一套批間控制的系統模式，證明以單一產品控制策略(Single-Product control)在生產單一規格的二氧化矽粒子時，批間控制確實可以在幾個實驗批次內消除因氨水揮發所導致的系統干擾，並重新調整下一個批次的實驗配方以改善前一個批次與下一個批次之間的變異，及應用前人的系統模式在製備二氧化矽粒子的實驗過程中，嘗試利用兩種不同的批間控制方法〝 Tool-based控制策略〞及〝Product-based控制策略〞探討在固定時間及室溫下氨水揮發所造成系統干擾，對於控制二氧化矽粒徑規格的可行性。

[1].Yablonovitch E., “Inhibited Spontaneous Emission in Solid-State Physics and Electronics”, Physical Review Letters, 58, 2059-2062, 1987

[2].John S., “Strong localization of photons in certain disordered dielectric superlattices”, Physical Review Letters, 58, 2486-2489, 1987

[3].Yablonovitch E., Gmitter T.J., “Photonic Band Structure：The Face-Centered-Cubic Case”, Physical Review Letters, 63, 1950-1953, 1989

[4].Keats J.B., Statistical applications in process control, New York :M. Dekker, 1996

[5].Seborg, D.E, T.F. Edgar, D.A. Mellichamp, Process Dynamics and Control, Wiley 2004

[6].Ying Zheng., Qwan-Han Lin.,David Shan-Hill., “Stability and performance analysis of mixed product run to run control”,Journal of Process Control, 16,431-443,2006.

[7].Moyne J., Del Castillo E., Hurwitz A.M., Run-to-Run Control in SEMICONDUCTOR MANUFACTURING , CRC Press LLC, 2001

[8].Del Castillo E., Statistical Process Adjustment for Quality Control, John Wiley & Sons, Inc., New York., 2002

[9].Lee K., Lee J.H., Yang D.R., Mahoney A.W., “Integrated run-to-run and on-line model-based control of particle size distribution for a semi-batch precipitation reactor”, Computers and Chemical Engineering, 26, 1117-1131, 2002

[10].Lee K., Lee J.H., Fujiwara M., Ma D.L., Braatz R. D., “Run-to-Run Control of Multidimensional Crystal Size Distribution in a Batch Crystallizer”, Proceedings of the American Control Conference, 2, 1013-1018, 2002

[11].Stöber W., Fink A., Bohn E., ”Controlled Growth of Monodisperse Silica Spheres in the Micro Size Range”, Journal of Colloid and Interface Science , 26, 62-69, 1968

[12].Bogush G..H., Tracy M.A., Zukoski IV C.F., ”Preparation of monodisperse silica particles：control of size and mass fraction”, Journal of Non-Crystalline Solids , 104 , 95-106 , 1988

[13].Park S.K., Kim K.D., Kim H.T., ”Preparation of silica nanoparticles: determination of the optimal synthesis conditions for small and uniform particles”, Colloids and Surfaces A: Physicochemical and Engineering Aspects , 197, 7-17, 2002

[14].Sadasivan S., Rasmussen D.H., Chen F.P., Kannabiran R.K., “Preparation and characterization of ultrafine silica”, Colloids and Surfaces A: Physicochemical and Engineering Aspects, 132, 45-52, 1998

[15].Sadasivan S., Dubey A.K., Li Y., Rasmussen D.H., ”Alcoholic Solvent Effect on Silica Synthesis-NMR and DLS Investigation”, Journal of Sol-Gel Science and Technology, 12, 5-14, 1998

[16].Bogush G..H., Zukoski IV C.F., “Studies of the Kinetics of the Precipitation of Uniform Silica Particles through the Hydrolysis and Condensation of Silicon Alkoxides”, Journal of Colloid and Interface Science, 142, 1-18, 1990

[17].Butler S.W., Stefani J.A., “Supervisory Run-to-Run Control of a Polysilicon Gate Etch Using In Situ Ellipsometry”, IEEE Transactions on Semiconductor Manufacturing, 7, 193-201, 1994

[18].Del Castillo E. and Yeh J.Y., "Optimizing Adative Controller for Run to Run Process Control: Software Implementation and Algorithmic Details", Technical Report, IMSE Dept., UTA, 1996

[19]. Edgar T.F., Campbell W.J., Bode C., “Model-based control in microelectronics manufacturing”, IEEE Conference on Decision and Control, 4, 4185-4191, 1999

[20].Lee K., Lee J.H., Fujiwara M., Ma D.L., Braatz R. D., “Run-to-Run Control of Multidimensional Crystal Size Distribution in a Batch Crystallizer”, Proc. ACC, 2, 1013-1018, 2002