本研究以Zygo干涉儀為量測工具，針對圓形、方形和長方形三種不同形狀光學鏡片以電子束蒸鍍單層SiO2薄膜，以鍍膜前後表面形貌實驗結果為依據，獲得蒸鍍前後平均表面曲率半徑，配合Stoney薄膜應力公式，評估蒸鍍後薄膜中之殘留應力值。本研究中提出全新的全域性薄膜中殘留應力的估算方法，採用Zernike 多項式函數做為位移場函數以擬合光學鏡片蒸鍍前後之表面形貌，並篩選滿足雙調和函數之多項式，探討光學鏡片蒸鍍前後表面形貌變化與蒸鍍後光學鏡片構件薄膜中剪應變之關係，判斷薄膜中殘留應力的形態及大小，和薄膜可能產生破壞的發生處。

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