非平衡磁控濺鍍法鍍著奈米晶氮化鈦鋯薄膜探討鈦鋯比對結構與性質之影響

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研究生：	陳契佑 Chen, Chi-You
論文名稱：	非平衡磁控濺鍍法鍍著奈米晶氮化鈦鋯薄膜探討鈦鋯比對結構與性質之影響 Characterization of structure and mechanical properties of nano-crystalline TiZrN films deposited by unbalanced magnetron sputtering: effect of Ti and Zr target current
指導教授：	喻冀平 Yu, Ge-Ping 黃嘉宏 Huang, Jia-Hong
口試委員:	李志偉 Lee, Jyh-Wei 謝章興 Hsieh, Jang-Hsing
學位類別：	碩士 Master
系所名稱：	原子科學院 - 工程與系統科學系 Department of Engineering and System Science
論文出版年：	2012
畢業學年度：	100
語文別：	英文
論文頁數：	62
中文關鍵詞：	氮化鈦鋯、薄膜、磁控濺鍍
外文關鍵詞：	TiZrN, thin film, magnetron sputtering
相關次數：	點閱：4 下載：0
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二元金屬氮化物薄膜已經被廣泛運用於工業界，用來作為保護基材的薄膜和微電子業的金屬層，主要是因為它具有高硬度，好的抗磨耗能力，以及耐腐蝕能力，隨著科技快速的進展，對於薄膜的品質要求也越來越高。在近十年來，三元的氮化物薄膜，例如:氮化鈦鋯、氮化鈦鋁、氮化鈦矽，開始被廣泛的研究，研究多一個元素的添加對於薄膜性質的影響。
在這次的研究中，我們會利用非平衡磁控濺鍍法於矽基材上鍍上一層具有奈米晶粒的氮化鈦鋯薄膜，並藉由改變鈦靶和鋯靶材的離子電流來改變薄膜鈦鋯比例，鈦靶的電流從0.16安培循序增加到0.32安培,鋯靶的電流也循序從0.32安培調降到0.16安培，並將兩個靶的總電流固定在0.48安培。濺鍍完成的試片將會利用各種儀器與方法進行性質與結構的觀察，我們會利用X光繞射光譜技術來觀察結構，並利用此結果計算出晶粒的尺寸與結構因子，利用低略角X光繞射光譜的結果來計算出薄膜的晶格參數，試片厚度和橫截面結構將會利用場發射掃描式電子顯微鏡觀察並量測得知，再利用拉塞福背向散射光譜技術量測出薄膜的成分比與堆積因子。硬度的量測將使用奈米硬度儀。另外，將使用原子力顯微鏡來得知試片表面的粗糙度，並且使用四點探針進行電阻係數的量測。

Binary metal nitride films has been commonly used in industry as protective coatings and metallization layer in microelectronics due to its high hardness, better wear resistance, and excellent corrosion resistance. With the considerably fast-progressing development in technology, the quality demands of which goes higher. In the past decade, ternary nitride films, such as TiZrN, TiAlN, TiSiN , have been widely researched for the addition of another element enhances the properties of which.
In this study, the nanocrystalline TiZrN thin films were deposited on Si(100) wafer using unbalance magnetron sputtering. The current of Titanium target and that of zirconium target changed from 0.16 to 0.32 A and thus changed the ratio of Ti to Zr, the total target current of which was fixed at 4.8 A. The microstructure of the TiZrN films was characterized by X-ray diffraction (XRD). The texture coefficient and grain size were both calculated according to the result of θ/2θ scans. The lattice parameters of the TiZrN films was calculated according to the result of grazing incident X-ray diffraction. The thickness and cross-section morphology of the TiZrN thin films was further observed and measured using field-emission gun scanning electron microscope (FE-SEM). The composition and packing factor of the TiZrN thin films were determined by the Rutherford Backscattering Spectroscopy (RBS). The composition of the TiZrN films was also determined using X-Ray photoelectron spectroscopy (XPS). The hardness of the TiZrN films was measured using nanoindenter. The electrical resistivity of the TiZrN films was measured using a four-point probe. The surface roughness of the TiZrN films was characterized by atomic force microscope (AFM). The residual stress of the TiZrN films were determined using a laser curvature measurement system.

Content
致謝    I
摘要    III
Abstract    V
Content    VII
List of Figures    X
List of Tables    XII
Chapter 1 Introduction    1
Chapter 2  Literature Review    3
1  Deposition Method: Unbalanced Magnetron Sputtering (UBM) System    3
2  Visual appearance of TiZrN films    5
3  The microstructure of TiZrN films    5
4  The mechanical properties of TiZrN films    7
5  The nano-composite of TiZr/TiZrN    10
6  The spinodal decomposition of TiZrN    11
Chapter 3  Experimental details    14
1  Specimen Preparation and Deposition Process    14
2  Structure characterization    17
2.1  θ/2θ Scan    17
2.2 Glancing Incident X-ray Diffraction (GIXRD)    18
2.3 Scanning electron microscopy (SEM)    18
2.4 Rutherford backscattering spectroscopy (RBS)    19
2.5 X-Ray photoelectron spectroscopy (XPS)    20
3 Properties measurements    22
3.1 Nanoidentation    22
3.2 Four-point probe    23
3.3 Atomic Force Microscopy (AFM)    23
3.4 Residual stress (Optical method)    24
3.5 Coloration    26
Chapter 4  Results    27
1 Compositions    30
1.1 XPS    30
1.2 RBS    33
2. Nanostructure of TiZrN films    35
2.1 SEM    35
2.2  XRD and GIXRD    39
3  Properties of the TiZrN films    45
3.1  Hardness    45
3.2 Electric resistivity    46
3.3 Residual stress    47
3.4 Roughness    48
3.5 Coloration    50
Chapter 5 discussion    52
1 Nanostructure of TiZrN films    52
2 Properties of the TiZrN films    54
2.1 Hardness    54
2.2 Resistivity    55
2.3 Residual stress    56
2.4 Roughness    57
Chapter 6 Conclusions    59
Reference    60


                                

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