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研究生: 陳憲宏
Chen, Shen-Hong
論文名稱: 以嚴格耦合波理論模擬自我複製式光子晶體對藍光發光二極體出光效率之提升
A Rigorous Coupled Wave Analysis of Auto-Cloning Photonic Crystals for Controlling Light Emission Characteristics of a GaN-Based Light Emitting Diode
指導教授: 劉容生
Liu, Yung-Sheng
趙煦
Chao, Shiuh
口試委員:
學位類別: 碩士
Master
系所名稱: 電機資訊學院 - 光電工程研究所
Institute of Photonics Technologies
論文出版年: 2009
畢業學年度: 97
語文別: 中文
論文頁數: 95
中文關鍵詞: 發光二極體光子晶體嚴格耦合波分析光子能隙
外文關鍵詞: LED, photonic crystal, RCWA, photonic band gap
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  • 本論文主要利用了「嚴格耦合波分析」,針對背部具自我複製式二維光子晶體[13][14]的氮化鎵材料之藍光發光二極體,建立了一套完整模擬具週期性結構的LED之出光特性的方法,並優化二維光子晶體之幾何形狀以其反射特性、繞射特性來提升光汲取效率。我們得到之最佳二維光子晶體結構為:「grating pitch=250nm、optical thickness=(1.3/4*中心波長)」,其光汲取效率為36.05%。相較於FDTD等演算法,利用這套計算方法可更加快速的得到二維光子晶體結構的最佳幾何參數,期望對於製程設計上能夠快速的給出一個明確的方向。


    In this research, we used a “rigorous coupled wave analysis” to characterize the light extraction property of a two-dimension photonic crystal of GaN-based blue LED and optimize the geometric configuration of the photonic crystal via controlling the photonic band gap and the diffraction efficiency. An optimized geometric configuration of the photonic crystal obtained under such calculation is “grating pitch=250nm、optical thickness=(1.3/4*central wavelength)”the extraction efficiency achievable under such condition is 36.05%. This algorithm is more efficient than FDTD or other common by used algorithms. The optimized geometric configuration of the photonic crystal could serve as useful guidelines for fabrication and design.

    中文摘要………………………………………………………………I 英文摘要………………………………………………………………II 致謝……………………………………………………………………III 目錄……………………………………………………………………IV 圖目錄…………………………………………………………………VII 表目錄…………………………………………………………………XIII 第一章 緒論…………………………………………………………1 1.1 前言…………………………………………………………1 1.2 文獻回顧……………………………………………………3 1.3 研究動機與目的……………………………………………5 第二章 嚴格耦合波分析(Rigorous Coupled Wave Analysis)…10 2.1 模擬工具……………………………………………………10 2.2 均勻及非均勻介質中之波動方程式………………………12 2.3 繞射角度與強度……………………………………………15 第三章 模擬流程與架構……………………………………………22 3.1 光源及光譜…………………………………………………22 3.1.1 光源………………………………………………………22 3.1.2 光譜………………………………………………………24 3.2 初始條件與模擬流程……………………………………27 3.2.1 初始條件…………………………………………………27 3.2.2 模擬流程…………………………………………………29 3.3 DiffractMOD輸出結果…………………………………… 33 3.3.1 原始場圖得法……………………………………………33 3.3.2 線性補點…………………………………………………38 3.3.3 繞射特性矩陣……………………………………………48 3.4 遠場分佈與光汲取效率之計算……………………………50 3.4.1 多重反射…………………………………………………50 3.4.2 遠場圖得法………………………………………………53 3.4.3 光汲取效率得法…………………………………………64 第四章 結構優化與討論……………………………………………70 4.1 調制參數與mapping結果………………………………… 70 4.2 模擬結果分析………………………………………………74 第五章 結論與未來展望……………………………………………85 5.1 結論…………………………………………………………85 5.2 未來展望……………………………………………………85 參考文獻…………………………………………………………………86 附錄A:Bloch Theorem…………………………………………………89 附錄B:TE-polarization之input與output場分佈比較圖………… 91 附錄C:Ta2O5/SiO2光學膜光學厚度與物理厚度對照表…………… 95

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