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研究生: 莊友杭
Juang, Yu-Hang
論文名稱: 以電漿輔助化學氣相沈積法於矽懸臂沈積之氮化矽薄膜應力對機械損耗之影響暨機械損耗量測系統改善
Stress effect on mechanical loss of the SiNx film deposited with PECVD method on silicon cantilever and setup for the loss measurement improvement
指導教授: 趙煦
口試委員: 李正中
陳至信
學位類別: 碩士
Master
系所名稱: 電機資訊學院 - 光電工程研究所
Institute of Photonics Technologies
論文出版年: 2014
畢業學年度: 103
語文別: 中文
論文頁數: 80
中文關鍵詞: 機械損耗矽懸臂氮化矽電漿輔助化學氣相沈積法重力波
外文關鍵詞: mechanical loss, cantilever, silicon nitride, PECVD, gravitational wave
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  • 美國雷射干涉重力波組織 (Laser Interferometer Gravitational Wave
    Observatory ;LIGO)以偵測重力波為主要研究項目,短期目標是以實際偵測到的重力波證明愛因斯坦的廣義相對論,長期目標則是希望能將重力波運用於各種天文現象的觀察及建立重力波天文網,例如中子星(neutron star)、黑(black hole)、超新星(supernovae)…等大質量星體的訊號。由於重力波的訊號相當微弱,因此需盡可能地排除外在雜訊的干擾,而在其總體雜訊最低的100Hz處,雜訊主要來自於光學反射鏡自身材料所產生的熱擾動,因此本實驗室的研究目標即是找尋光學損耗、機械損耗皆低的光學薄膜材料。
    本論文的研究重點係以電漿輔助化學氣相沉積系統於矽懸臂上鍍製各種不同成分的氮化矽薄膜,並檢視各成分薄膜的光學特性(折射率、消散係數)、機械特性(薄膜應力、楊氏係數)及機械損耗特性,其中薄膜應力與機械損號間的關係為本論文將深入探討之重點。此外,本論文的另一重點為本實驗室室溫機械損耗量測系統的抽氣速率改善,以及低溫機械損耗量測系統之架設。


    摘要 致謝 圖目錄 表目錄 第一章 導論 1-1引言 1-2研究動機 第二章 單晶矽懸臂與氮化矽薄膜製程 2-1.矽懸臂結構與製程 2-2.氮化矽薄膜製程 第三章 氮化矽薄膜特性分析 3-1.氮化矽薄膜成分 3-2.折射率與消光係數 3-3.薄膜厚度 3-4.薄膜應力 3-5.楊氏係數 第四章 機械損耗量測 4-1.矽懸臂基板損耗量測 4-1.1.室溫機械損耗量測原理與系統介紹 4-1.2.矽懸臂基板機械損耗統計與分析 4-1.3.矽懸臂機械損耗各模態分析 4-1.4.矽懸臂於夾持時是否清潔對量測之影響 4-2.氮化矽薄膜機械損耗 4-2.1.薄膜機械損耗量測與分析 4-2.2.薄膜機械損耗與薄膜成份之關係 4-2.3.薄膜損耗高頻特性分析 4-2.4鍍膜前後矽懸臂損耗與Thermoelastic理論值之關係 4-3.新架設之損耗量測系統 4-3.1. 新系統與原系統之架構比較 4-3.2新系統操作流程 4-3.3 新系統之抽氣效率改善 4-4.電極板距離對Free damping之影響 第五章 低溫機械損耗量測系統 5-1.機械損耗於低溫之特性 5-2.低溫量測系統架構與操作 5-3低溫系統振動測試 5-3.1震動量測原理 5-3.2測試結果與討論 第六章 結論與未來展望 6-1結論 6-2未來展望 參考文獻

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