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研究生: 陳柏洲
Po-Chou Chen
論文名稱: 繞射式雷射光束整型元件於顯示系統之應用
The application of diffractive laser beam shapers for display technplogy
指導教授: 陳政寰
Chung-Huan Chen
口試委員:
學位類別: 碩士
Master
系所名稱: 工學院 - 動力機械工程學系
Department of Power Mechanical Engineering
論文出版年: 2007
畢業學年度: 95
語文別: 中文
論文頁數: 80
中文關鍵詞: 雷射光束整型繞射光學元件雷射投影顯示器
外文關鍵詞: Beam shaper, Diffractive optical element, Laser, Projection display
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  • 雷射光束整型元件的功能在於根據不同的應用操控光束的大小、形狀、能量分佈以及相位,例如材料加工、訊號處理以及照明等。在大部分應用中需要將高斯能量分佈的雷射光整形成平頂式的能量分佈,特別是在材料加工以及照明的應用上。因此在本論文設計二種繞射元件將雷射光束整形成平頂式的能量分佈分別應用於材料加工以及照明。
    首先,為一四階的二元光學元件搭配柱狀透鏡將高斯能量分佈的雷射整形成平頂式的線形能量分佈,並應用於雷射退火加工。
    再者,為研究高分子薄膜光學元件在同調性光源照射下所產生之繞射光能量分布,並將相關技術應用於顯示器。係以一新式雷射照明投影顯示系統為目標,設計ㄧ可使雷射光束直接均勻照明於微顯示器上之繞射元件,並以高分子薄膜技術製作實現。


    The function of laser beam shaping is to manipulate the size, profile, irradiance and/or phase distribution of the laser beam for various applications, such as material processing, signal processing and illumination etc. For most applications, it is desired to transform the original Gaussian irradiance distribution into a flat-top uniform distribution, which is especially important for material processing and illumination.
    In this paper, two kinds of diffractive elements have been designed and analyzed, they can transform the original Gaussian irradiance distribution into a flat-top uniform distribution and can be applied them to material processing and illumination respectively.
    Firstly, a binary optical element with surface relief of four quantized levels associated with a cylindrical lens has been designed to transform the original Gaussian irradiance distribution into a line beam with flat-top uniform distribution and apply to laser annealing processing.
    Secondly, the diffraction pattern of coherent light source modulated by polymer lenslet array has been investigated, and applied to a laser illuminated projection system. The diffractive optical element, which can transfer the laser beam into a uniform illumination source on the microdisplay, has been designed and implemented with polymer thin film technology.

    摘要....................................I 誌謝辭..................................IV 目錄....................................V 圖目錄..................................VIII 表目錄..................................XI 第 一 章 緒論........................................1 1.1 研究背景.........................................1 1.2低溫退火製程之繞射式光束整型元件設計..............2 1.3 二極體雷射整型應用於微型投影機...................3 第 二 章 雷射光束整型................................4 2.1 高斯光束特性.....................................4 2.2 雷射光束整型方式.................................7 第 三 章 繞射元件...................................10 3.1 繞射元件簡介.....................................10 3.1.1 繞射元件的功能.................................10 3.1.2 繞射元件之優點.................................11 3.1.3 繞射元件設計方法..............................13 3.1.4 繞射元件的製作方式............................14 3.2 繞射理論........................................18 3.2.1 繞射公式推導 ..................................18 3.2.2 繞射公式與傅立葉轉換 .........................25 第 四 章 低溫退火製程之繞射式光束整型元件設計 .......26 4.1 低溫多晶矽退火製程簡介 .........................26 4.2 光束整型元件設計流程.............................31 4.3 光束整型元件設計模擬結果.........................33 4.4 光束整型元件製作與量測結果.......................42 4.4.1 元件製作 ..................................42 4.4.2 光場量測結果 ..................................45 第 五 章 二極體雷射光束整型應用於微型投影機.........47 5.1 微透鏡陣列簡介 ..................................47 5.2 實驗與模擬方法..................................49 5.2.1 實驗量測設備簡介..............................50 5.2.3 模擬分析方法 ..................................54 5.3 模擬與量測結果 ..................................55 5.3.1 實際量測結果與幾何光束追跡模擬結果............55 5.3.2 實際量測結果與純量繞射理論模擬結果.............58 5.4 微透鏡陣列應用於微型投影機.......................65 5.4.1 穿透式投影顯示器簡介...........................66 5.4.2 雷射投影機.....................................69 5.5 微透鏡陣列之設計.................................74 第 六 章 結論........................................77 參考文獻.............................................79

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