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研究生: 陳緯恩
Chen, Wei-En
論文名稱: 電漿子奈米圓孔陣列與Rhodamine 6G染料分子之交互作用實驗研究
Optical Study of the Interaction between Plasmonic Nanohole Array and Rhodamine 6G Dye Molecules
指導教授: 果尚志
Gwo, Shangjr
口試委員: 安惠榮
Ahn, Hyeyoung
張玉明
Chang, Yu-Ming
學位類別: 碩士
Master
系所名稱: 理學院 - 物理學系
Department of Physics
論文出版年: 2019
畢業學年度: 108
語文別: 中文
論文頁數: 65
中文關鍵詞: 強耦合金屬奈米圓孔陣列表面晶格共振耦合震盪模型
外文關鍵詞: strong coupling, metallic nanopore array, surface lattice resonance, coupled oscillation model
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  • 近幾十年來,光與物質的交互作用十分熱門,像是雷射、表面增強拉曼和強光物質交互作用等。其中強光物質交互作用更是各界更感興趣的事,而強耦合現象並不是在光與物質交互作用中才出現,從雙彈簧震盪、耦合雙擺到強光物質作用都是所謂的強耦合現象。在達成光與物質的強耦合後,又可以朝玻色愛因斯坦凝聚、極化子雷射等有趣的現象來做研究,這更令我們感興趣,也是本篇論文會誕生的原因。
    本論文是在研究金屬奈米圓孔陣列的表面晶格震盪模態與激子染料Rhodamine 6G(Rh6G)的激子模態的強耦合現象。本文的實驗分成兩個部分,第一部分為金屬奈米圓孔陣列的週期、占空比與深度對於表面晶格共振模態的影響;第二部分為Rh6G濃度變化與耦合強度的關係。
    第一部分的結果分為三個,第一個,在占空比與深度固定的條件下,周期越大共振位置會紅移、Q-factor會固定;第二個,在週期與深度固定的情況下,占空比越大共振位置會紅移,Q-factor會變小;第三個,在週期和占空比固定,深度越深共振位置微微紅移,Q-factor會微微變小。第二部分的結果為耦合強度與Rh6G濃度平方根成線性關係,與理論預測的一樣。最大的分裂距離為237 meV。
    最後是在討論使用三階耦合震盪模型來分析本論文的實驗數據,發現耦合強度g1和g2一樣隨著濃度增加而增強,且在濃度為15 mM時觀測到等效的Rabi Splitting竟然高達433 meV,是非常值得深入研究的主題。


    In recent decade , the strong coupling between the light and the matter is popular in the world . Strong coupling is a general phenomenon from classical to quantum . For example : two coupled strings , coupled pendulums and strong light-matter interaction . When we reach the strong coupling regime , we can research more interesting effect like Bose-Einstein condensation and polariton laser.
    In this thesis , we research the strong coupling between the plasmonic nanohole array and Rhodamine 6G (Rh6G) . There are two parts in my result . One part is the influence including the pitch , the filling factor and the depth for the SLR mode of plasmonic nanohole array and introduce the properties of rectangular array. The other is the relation between the concentration of Rh6G and the coupling strength . The coupling strength is proportion to the square root of Rh6G’s concentration . The maxima of the splitting energy is 237 meV and the effective Rabi Splitting is 433 meV at 15 mM for our system .

    國 立 清 華 大 學 摘要 I Abstract II 致謝 III 目錄 IV 圖目錄 VI 表目錄 XII 第一章 簡介以及原理 1 1.1. 簡介及動機 1 1.2 表面電漿極化子 3 1.3 局域共振激發-Metal nanohole 4 1.4聚集激發共振-Surface Lattice Resonance 6 1.4.1 Empty Lattice Approximation 6 1.4.2 Lattice of Point Dipoles 7 1.5 SPP Mode和Rh6G的交互作用 9 1.5.1 Rh6G簡介 9 1.52 Q-factor 12 1.5.3光與物質的強耦合現象 13 第二章 數據分析方法 21 2.1 耦合震盪模型 21 2.2 耦合震盪模型的分析 22 第三章 實驗內容 25 3.1儀器介紹以及樣品製備方法 25 3.1.1熱蒸鍍成長Ag film 25 3.1.2使用FIB(Focus Ion Beam)蝕刻金屬奈米圓孔陣列 26 3.1.3使用原子層沉積(Atomic Layer Deposition , ALD)鍍Al2O3 28 3.1.4溶液的製備 29 3.1.5均勻旋塗溶液到結構上 30 3.2量測 31 3.2.1 傅立葉譜 31 第四章 實驗結果以及分析 33 4.1 金屬奈米圓孔陣列的色散曲線 33 4.1.1週期p與SLR的關係 34 4.1.2占空比f與SLR的關係 37 4.1.3深度d與SLR的關係 40 4.1.4長方陣列的SLR mode 43 4.2 Rh6G濃度與耦合的關係 47 4.2.1 Rh6G濃度對於excitonic mode的關係 47 4.2.2 Rh6G濃度對於長方陣列的耦合關係 50 第五章 討論:三階耦合震盪模型 57 第六章 結論 62 第七章 參考文獻 64

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