研究生: |
王玟翔 Wang, Wen-Hsiang |
---|---|
論文名稱: |
以T形微帶共振腔及多層介質微帶線量測金屬薄膜在微波頻段之導電率變化 Conductivity measurements of metallic films at various microwave frequencies using T-resonator method and multilayer micro-strip line |
指導教授: |
呂助增
Lue, Juh-Tzeng |
口試委員: | |
學位類別: |
碩士 Master |
系所名稱: |
理學院 - 物理學系 Department of Physics |
論文出版年: | 2009 |
畢業學年度: | 97 |
語文別: | 中文 |
論文頁數: | 44 |
中文關鍵詞: | 微波 、微帶線 、多層介質 、共振腔 |
外文關鍵詞: | microwave, microstrip, multilayer, resonance cavity |
相關次數: | 點閱:2 下載:0 |
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對一般的共振腔而言,產生能量偶和的air-gaps之輸出及輸入端在高頻的時候會產生很大的幅射損耗,而為了消除此問題,我們使用T形(沒有air-gap)微帶共振腔以及多層介質的微帶線兩種不同方式來量測出金屬薄膜的微波頻段導電率。數據是由向量網路分析儀(HP-8722D)所測得,在經過電磁理論計算後T形微帶共振腔量測法可獲得金屬薄膜在微波頻段的導電率,但多層介質線形微帶計算出的值都接近零,不合理,最後我們對這兩種量測方法之做一比較。
參考資料
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