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研究生: 吳忠鴻
Zhong-Hong Wu
論文名稱: 以CMOS製程製作具光感測器之微抓取器
CMOS Micromachined Grippers with On-Chip Optical Detection
指導教授: 盧向成
Shiang-Cheng Lu
口試委員:
學位類別: 碩士
Master
系所名稱: 電機資訊學院 - 產業研發碩士積體電路設計專班
Industrial Technology R&D Master Program on IC Design
論文出版年: 2007
畢業學年度: 95
語文別: 中文
論文頁數: 62
中文關鍵詞: 聚苯乙烯微珠互補式金氧半導體微夾取器光感測器熱驅動濕蝕刻XeF2
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  • 本論文將介紹以CMOS〈互補式金氧半導體〉製作出微夾子之設計及製程,光感測器將置於結構的正下方。它的製程特色是結合了金屬的濕蝕刻與犧牲層polysilicon 的乾蝕刻使得結構得到懸浮的狀態。而這微結構是用金屬與介電層所組合也包括了加熱器polysilicon做為電熱致動器。這電熱致動器需提供6 mW,單臂可以產生3.6um的平面位移量以及1.6um的向上位移量。相對的,加熱器溫度有220□C而結構的頂端溫度只上升了28□C。對於光感測器所量測出感光度和動態範圍分別是1.42 V/lux□sec和48.5 dB。我們量測到在有及沒有夾取到聚苯乙烯微珠時,在100 lux之下有0.06 V的電壓反應。
    在這個研究裡,我們希望利用CMOS-MEMS的技術,製作一個嶄新結合致動器影像感測器的微結構,我們所希望製作的是能操縱抓取細胞分子、及提供即時影像感測的8 * 8陣列晶片,這樣的晶片目前在文獻中尚未出現。我們相信將微夾子陣列製作於CMOS上並利用光感測器晶片作影像感測在學術上也會是一個重要的貢獻!


    This paper presents the design, fabrication, and characterization of CMOS (Complementary metal oxide semiconductor) micromachined grippers with on-chip photo detectors placed beneath the gripping sites. The fabrication features a combination of metal wet etch and sacrificial polysilicon etch for structural release. The fabricated microstructure contains metal and dielectric layers, plus a polysilicon heater for electrothermal actuation. For an applied power of 6 mW, one arm of the gripper produces a 3.6-□m in-plane displacement and a 1.6-□m out-of-plane displacement. The corresponding heater temperature is 220□C, and the temperature elevation at the tip is only 28□C. The measured sensitivity and dynamic range of the photo detector are 1.42 V/lux□sec and 48.5 dB, respectively. For measurements with and without grabbing a polystyrene bead, the difference of sensed voltages is 0.06 V at 100 lux.
    In this project, we try to introduced a novel integrated CMOS-MEMS structure which can perform thermal actuation and optical detection. We believe that it will be a great contribution to make micro gripper array with optical detection in a conventional CMOS process.

    誌謝 I 中文摘要 II 摘要(英) III 目錄 IV 表目錄 VI 圖目錄 VII 圖目錄 VII 第一章 緒論 1 1-1前言 1 1-2微抓取器 3 1-3 文獻回顧 5 1-4 研究目標 13 第二章 結構設計與製程 15 2-1 結構設計 15 2-2結構製程 18 2-3後製程 20 2-4濕蝕刻 23 2-4乾蝕刻 26 第三章 CMOS影像感測器之設計與分析 29 3-1 影像感測器 29 3-1-1 CMOS與CCD之構造與動作方式的差異 31 3-1-2 CMOS影像感測器 33 3-2光二極體 36 3-3 電路分析 37 第四章 模擬與量測結果 41 4-1 結構模擬與量測 41 4-2電路模擬與量測 51 □第五章 結論 57 5-1 研究成果 57 5-2 未來工作 58 參考文獻 59

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