本碩士論文研究方向主要分為兩大部分，第一部分為研發表面聲波元件以偵測胺類氣體，主要是以金屬紫質系列的氯化血紅素，當作表面聲波感測器的感測薄膜，吸附常見的臭味胺類氣體，結果顯示此種感測薄膜對胺類氣體有一定的選擇性；除此之外，利用IR及XPS測定氯化血紅素中央鐵金屬的配位吸附以及周圍酸根的酸鹼反應，了解感測薄膜和胺類氣體的吸附作用機制。

第二部分為研發超臨界二氧化碳法以去除乾式蝕刻及電漿灰化後的光阻殘餘物。首先利用XPS、SIMS及SEM觀察及鑑定殘餘物的結構，設計使用過氧化苯甲醯溶解於乙醯丙酮之中，加入催化劑三乙胺，再注入超臨界二氧化碳之中，於60℃及80℃水浴中，清洗光阻殘餘物。結果顯示，藉由超臨界流體溶解反應物並帶入樣品中，利用過氧化物氧化降解高分子的機制，可有效地去除矽層上的高分子光阻殘餘物。

1.莊萬發, 香臭氣味控制應用. 1版2刷; 復漢: 2000;
2.http://nobelprize.org/medicine/laureates/2004/press.html
3.鍾文聖, 江佩珍, 超分子化學的發展及應用. 化學 2003, 61(4), 557-573
4.Reguera E, Balmaseda J, Fernandez-Bertran J, Paneque A, Yee-Madeira H, Complex formation of ferric protoporphyrin IX from the reaction of hemin with ammonia and small aliphatic amines. TRANSITION METAL CHEMISTRY 2004, 29(4), 451-456
5.D'Amico A, Di Natale C, Paolesse R, Macagnano A, Mantini A, Metalloporphyrins as basic material for volatile sensitive sensors. Sensors and actuators. B, Chemical 2000, 65(1-3), 209-215
6.Qin W, Parzuchowski P, Zhang W, Meyerhoff ME, Optical sensor for amine vapors based on dimer-monomer equilibrium of indium (III) octaethylporphyrin in a polymeric film. Analytical chemistry 2003, 75(2), 332-340
7.Valkova L, Borovkov N, Koifman O, Kutepov A, Berzina T, Fontana M, Rella R, Valli L, Sorption of amines by the Langmuir-Blodgett films of soluble cobalt phthalocyanines: evidence for the supramolecular mechanisms. Biosensors & Bioelectronics 2004, 20(6), 1117-1184
8.Paolesse R, Di Natale C, Dall'Orto VC, Macagnano A, Angelaccio A, Motta N, Sgarlata A, Hurst J, Rezzano I, Mascini M, D'Amico A, Porphyrin thin films coated quartz crystal microbalances prepared by electropolymerization technique. Thin solid films 1999, 354(1-2), 245-250
9.Corrado Di Natale, Danio Salimbeni, Roberto Paolesse, Antonella Macagnano; D’Amico, Arnaldo, Porphyrins-based opto-electronic nose for volatile compounds detection. Sensors and Actuators B 2000, 65, 220-226
10.Arnaldo D'Amico, Corrado Di Natale, Antonella Macagnano, Fabrizio Davide; Alessandro Mantini, Enrico Tarizzo, Roberto Paolesse, Tristano Boschi, Technologies and tools for mimicking olfaction: status of the Rome "Tor Vergata" electronic nose. Biosensors & Bioelectronics 1998, 13, 711-721
11.楊家銘, 奈米孔洞材料之物理吸脫附分析. 科儀新知 2005, 26(6), 32-38
12.史作清, 李家政 姚康德, 配位吸附. 化學通報 2004, 67, 1-9
13.Helfferich, F., "Ligand exchange": A novel separation technique. Nature 1961, 189, 1001-1002
14.Walton, H. F., Liquid-Exchange Chromatography - A Brief Review. Industrial & engineering chemistry research 1995, 34(8), 2553-2554
15.Helfferich, F., Ligand Exchange. I. Equilibria. J. Am. Chem. Soc. 1962, 84(17), 3237-3242
16.Walton, H F., J. Chromatography 1974, 102, 57-59
17.D Kunzru, R W Frei., J. Chromatography Sci. 1974, 12, 191-196
18.James D. Navratil, Harold F. Walton, Ligand-exchange chromatography of diamines and polyamines. Analytical chemistry 1975, 47(14), 2443-2446
19.Chanda M, Odriscoll KF, Rempel GL, Ligand Sorption of Aromatic-Amines On Resin-Bound Ferrous Ion. Reactive polymers 1984, 2(4), 279-290
20.Pilloud DL, Chen XX, Dutton PL, Moser CC, Electrochemistry of self-assembled monolayers of iron protoporphyrin IX attached to modified gold electrodes through thioether linkage. journal of physical chemistry. B, Materials, surfaces, interfaces & biophysical 2000, 104(13), 2868-2877
21.Pilloud DL, Moser CC, Reddy KS, Dutton PL, Surface-promoted thioether linkage between proto- or hemato porphyrins and thiol-silanized quartz: Formation of self-assembled monolayers and interaction with imidazole and carbon monoxide. Langmuir 1998, 14(17), 4809-4818
22.Armando Paneque, Jose´ Ferna´ndez-Bertra´n; Edilso Reguera, and H. Yee-Madeira, Spectroscopic Characterization of Complexes Obtained by Mechanochemical Reactions of Hemin. Spectroscopy letters 2003, 36(1), 83-92
23.M. Olszak-Humienik, M. Kotfica, J. Mozejko, Comparison of Binding Energies of Selected Environmental Xenobiotics by Porphyrin Complexes. Bull. Environ. Contam. Toxicol. 2002, 69, 41-48
24.Christopher Fietzek, Michael Seiler, Bernd Go¨rlach,Peter Schu¨tz,Udo Weimar; Michael Hanack, Christiane Zieglerc and Helmut Bertagnollid, Reversible intercalation of volatile amines into stacks of soluble phthalocyanines. J. Mater. Chem. 2002, 12, 2305-2311
25.B.A. Snopok, I.V. Kruglenko, Multisensor systems for chemical analysis: state-of-the-art in Electronic Nose technology and new trends in machine olfaction. Thin Solid Films 2002, 418, 21-41
26.A. Reiser, J.P. Huang, X. He, T.F. Yeh, S. Jha, H.Y. Shih, M.S. Kim, Y.K. Han, K. Yan, The molecular mechanism of novolak-diazonaphthoquinone resists. European Polymer Journal 2002, 38, 619-629
27.Zant, Peter Van, Microchip fabrication: a practical guide to semiconductor processing. 4; McGraw-Hill: 2000; p chapter 9.
28.I. I. Kashkoush, R. Matthews, and R. E. Novak In A Novel Method for Photoresist Stripping Using Ozone/Deionized Water Chemistry, IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings, San Francisco, CA, USA, 1997;
29.S. De Gendt, P. Snee, I. Cornelissen, M. Lux, R. Vos, P. W. Mertens, D. M. Knotter, M. M. Meuris, and M. Heyns, A novel resist and post-etch residue removal process using ozonated chemistry. Solid State Phenomena 1999, 65-66, 165-168
30.http://www.epa.gov/greenchemistry/sba02.html
31.Satyanarayana Myneni, Dennis W. Hess, Post-Plasma-Etch Residue Removal Using CO2-Based Fluids. Journal of the Electrochemical Society 2003, 150, (12), G744-G750
32.William H. Mullee, et al. Removal of Photoresist and residue from substrate using supercritical carbon dioxide process. US6500605, 2002
33.Patrick C. Joyce, et al. Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials. US6764552, 2004
34.Adrianne Kay Tipton, et al. Method for removing photoresist and post-etch residue using activated peroxide followed by supercritical fluid treatment. US6800142, 2004
35.McCoy, Y. C. Kim and B. J., Degradation kinetics enhancement of polystyrene by peroxide addition. Industrial & Engineering Chemistry Research 2000, 39, 2811-2816
36.Chattopadhyay, G. Madras and S., Optimum temperature for oxidative degradation of poly(vinyl acetate) in solution. Chemical Engineering Science 2001, 56, (5085-5089),
37.G. Sivalingam, Giridhar Madras, Oxidative degradation of poly (vinyl acetate) and poly (-caprolactone) and their mixtures in solution. Chemical Engineering Science 2004, 59, 1577-1587
38.Kim, Hyungtak Seo and Sung Bae, Low temperature remote plasma cleaning of the fluorocarbon and polymerized residues formed during contact hole dry etching. J. Vac. Sci. Technol. B 2002, 20, (4), 1548-1555
39.Saga K, Hattori T, Identification and removal of trace organic contamination on silicon wafers stored in plastic boxes. Journal of The Electrochemical Society 1996, 143, (10), 3279-3284
40.Naoto Matsuo, Naoya Kawamoto, Daisuke Aihara, Tadaki Miyoshi, Initial stage of adsorption for organic carbons and native oxide growth on Si wafer. Applied Surface Science 2000, 159-160, 41-44
41.Giridhar Madras, Sujay Chattopadhyay, Optimum temperature for oxidative degradation of poly(vinyl acetate) in solution. Chemical Engineering Science 2001, 56, 5085-5089
42.Beckman, E. J., A challenge for green chemistry: designing molecules that readily dissolve in carbon dioxide. Chem. Commun. 2004, 1885-1888