由於液晶顯示器(Liquid Crystal Display; LCD)應用市場的快速變化，對於彩色濾光片的需求也是日新月異地演進。高精細、高性能需要的液晶顯示器而言，導入高效率的平坦化製程以及相關造型輔助的設計技術是LCD產業步入次世代發展必經之路。
本文內容包含於彩色濾光片產業多年工作經驗與想法做一彙整如下：
1. 提出了導入化學機械平坦拋光作業的CFP彩色濾光片製程技術，有效達成次世代LCD對於彩色濾光片的高表面平坦度幾何公差要求。同時，更藉此技術得以降低生產成本、製造工序，及減少不良品的發生。
2. 提出利用CFP拋光技術與變動上色順序的概念，針對次世代高開口率LCD進行所需求之極精細BM線寬製程技術開發，並完成5.8□m BM線寬之樣品實作。
3. 提出客觀評價彩色濾光片表面平坦度特性(Degree of Planarization; DOP)評價指標系統，以符合彩色濾光片之特殊造型需求。
4. 創先在彩色濾光片製作技術中導入近接光學修正(Optical Proximity Correction)的微影光罩補償技術，完成具高度光阻圖形擬真度(Pattern Fidelity)的樣品。
彩色濾光片是LCD中對於色彩表現的關鍵零組件。除了色彩表現外，彩色濾光片的各項幾何構造與誤差（如線寬、光阻造型擬真度、表面平坦度、成膜厚度、Total Pitch、重疊寬度等）也都在LCD的整體表現上扮演某種重要的關鍵角色。因此開發出得以使彩色濾光片各項幾何構造更精確、誤差越低的製程方法是未來繼續發展的方向。

An effective process for fabricating color filters (CF) must satisfy three requirements: 1. low-cost material, 2. simple procedures, and 3. high throughput. Several systemic issues affect the conventional CF process, such as the pigment-dispersion method. For high yield and low cost, it is necessary to develop a new fabrication method for CFs, which are not affected by these systemic issues. In this paper, an entirely new process for fabricating CFs is introduced. This process, which satisfies the three requirements above, introduces chemical-mechanical polishing techniques to produce CFs for LCDs. Because of the usage of chemical-mechanical polishing techniques, this new CF fabrication method is named the color filter polishing (CFP) method.
Based on the high resolution and high aperture ratio needed for LCD (Liquid Crystal Display), we introduced the advanced color filter polishing technology for processing a fine line-width BM (Black Matrix) of a color filter. The dimensional compensation method for the pattern-size design of the photo-mask according to the characteristics of the colorant resists was described to rectify the line-width variation caused by the proximity aligner, the most popular exposure machine in the color filter manufacturing. In this paper, we introduce the color filter polishing and the photo-mask compensation technologies into the present color filter process flows and equipments to achieve the need for a fine line-width BM to increase the aperture ratio of LCD and to accomplish a real color filter sample with 5.8□m line-width BM.
For portable digital displays, the pattern of a color filter should resemble the design pattern as much as possible to avoid contrast loss within the liquid crystal display (LCD). The higher the quality requirement of a LCD is, the smaller the difference between the design pattern and the actual pattern of a color filter, also known as “pattern fidelity,” should be. In this work, we use the histogram of the different segments between the designed pattern and the actual pattern to define the critical shape error (CSE) indices, CSEavg, CSE90, and CSE80, the area percentage indices of the “white zone” (W.Z. Area %) and the “over zone” (O.Z. Area %), and the maximum segment width of the “over zone” (Max. CSE width). Through the evaluation of all indices of the optical proximity correction (OPC) patterns, we choose the optimal OPC pattern, the hexagon OPC pattern circumscribing a circle of diameter in 3□m, and have a color filter with very good pattern fidelity.

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