本文利用無電鍍鎳技術，配合各項材料性質分析，建構出能應用於奈米壓印模具製作之實驗流程。使用此技術之原因在於：1. 無電鍍為自身還原析鍍反應，待鍍物與鍍液接觸後，鍍液中之金屬離子即可藉由還原作用析鍍於具催化性之基板表面，不受工件形狀影響，可運用於平面以及非平面壓印模具之製作。其成本低與操作簡易的特性，可大幅降低奈米壓印模具製作成本；2. 藉由無電鍍所沉積之鎳磷合金具有良好的表面粗糙度、摩擦係數以及機械強度，以此技術所製作之壓印模具，較傳統昂貴之矽模具適合於連續奈米壓印製程之應用。

本研究首先在具反應性的金屬基板上均勻塗佈光阻，並定義其圖案。光阻的定義方式包含曝光微影以及奈米壓印技術，經由此兩種製程得到具備微奈米尺度之光阻結構。最後，經由無電鍍鎳沉積鎳磷合金，並利用高分子溶劑以及氧電漿蝕刻技術將殘餘光阻移除，製作出符合精密尺寸之鎳磷合金模具。

實驗結果顯示利用無電鍍鎳技術已可成功製作出線寬120 nm，高度180 nm且具備良好結構成型性之壓印模具，經測試可於PMMA以及熱壓光阻上轉印出結構均勻之圖型，配合各項材料特性的分析，未來將能有效提供奈米壓印模具製備之具體製作方案。
關鍵字：無電鍍鎳、奈米壓印、模具製作

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