本篇論文中，共包含兩個部分，第一部分研究以感應耦合式電漿源成長低介電常數碳化矽薄膜，作為在未來真空紫外光波段(F2準分子雷射，波長為157nm)與深紫外光波段(ArF準分子雷射，波長為193nm)光阻底部抗反射層，在阻劑下加上此抗反射層可以有效降低來自底材的反射率，而且還可以適用於各種不同高反射率的底材如鋁、銅、複晶矽等等，除此之外薄膜並無鹼性氣體(NH3)的釋出而傷害到化學增幅型光阻，本抗反射層經氧電漿表面修飾後薄膜均勻性佳，因此不會產生凹缺效應(notching effect)，其次薄膜的其他特性如機械性質、化學性質與物理性質等，論文中皆有詳細探討。
論文的另一部分為研究金奈米粒子沉積時受各種不同二氧化矽薄膜底材的影響與結合光學微影技術來選擇區域成長，研究中發現薄膜表面的粗糙度對於金奈米粒子的吸附扮演著極重要的角色，而薄膜含氧的比例也會對金奈米粒子密度有一定的影響。此外，由可見光-紫外光光譜儀中可以觀察出金奈米粒子在經過乙醇清洗去除光阻後其表面電漿共振特性吸收峰並不會有所變化，因此透過光學微影方式我們可以快速的製備高密度，高均勻性、高品質且任意定義金奈米粒子排列圖案於晶圓上。

In this thesis, our study contains two parts. First, low dielectric constant silicon carbide films were deposited by inductively coupled plasma to make a bottom antireflective coating layers for vacuum and deep ultraviolet lithographies. We can reduce the reflection from substrate dramatically after adding thin films. In addition, this BARC can be used for various highly reflective substrates such as Al, Cu, TaN, poly-Si, Pt, and W. This BARC film will not degrade chemical amplified photoresist because of no alkaline gas desorption during the post exposure bake procedure. This BARC was also modified the surface to form gradient absorption optical film by oxygen plasma treatment.
The second part, we study that different substrates influence gold nanoparticles deposition and combine with optical lithography to form pattern. We find that gold nanoparticles deposition has something to do with roughness of topography. And the density of gold nanoparticles relates to oxygen composition of substrates. Besides, by using UV-vis spectrometer the peaks of surface plasmon resonance don’t shift after rinsing alcohol but sulfuric acid shift. Therefore, we can pattern high uniform, high density and good quality gold nanoparticles rapidly by virtue of conventional optical lithography.

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