研究生: |
周育稔 Jou, Yuh-Reen |
---|---|
論文名稱: |
應用於電阻式記憶體之全透明氧化鋅薄膜 Resitive Switching of Transparent ZnO Thin Film for Memory Application |
指導教授: |
吳泰伯
Wu, Tai-Bor |
口試委員: | |
學位類別: |
碩士 Master |
系所名稱: |
工學院 - 材料科學工程學系 Materials Science and Engineering |
論文出版年: | 2010 |
畢業學年度: | 98 |
語文別: | 中文 |
論文頁數: | 67 |
中文關鍵詞: | 電阻式記憶體 、氧化鋅 、透明 、AZO 、非揮發 |
相關次數: | 點閱:3 下載:0 |
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本實驗以射頻磁控濺鍍法鍍製具 (002) 軸向的氧化鋅薄膜,搭配透明導電薄膜為上下電極,組成如電容的金屬/氧化層/金屬的三明治結構,嘗試完成一全透明電阻式記憶體,並觀察各結構的RRAM電阻轉換情形。
在金屬/氧化層/金屬中,以透明導電薄膜取代金屬,考慮透明導電薄膜電阻率:AZO電極須在鍍製時基板加熱具有較佳電阻率及穿透率;ITO在室溫鍍製即可具有良好電阻率。以上述導電薄膜為電極,製備AZO/ZnO/AZO、ITO/ZnO/ITO、Pt/ZnO/AZO結構,分別探討電極、氧化層、界面處分別對電阻轉換所造成影響。
利用此三種結構,發現界面對電阻轉換造成影響較大,使用具有高功函數Pt可具有較佳電阻轉換情形。
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