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[1] Michael D. Austin, Haixiong Ge, Wei Wu, Mingtao Li, Zhaoning Yu, D. Wasserman, S. A. Lyon, and Stephen Y. Chou, “Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography”, Applied Physical Letter, Vol. 84, No. 26, pp. 5299, (2004).
[2] Stephen Y. Chou, Peter R. Krauss, and Preston J. Renstrom, “Imprint of sub‐25 nm vias and trenches in polymers”, Applied Physical Letter, Vol. 67, No. 21, pp. 3114, (1995)
[3] Stephen Y. Chou, Peter R. Krauss, Wei Zhang, Lingjie Guo, and Lei Zhuang, “Sub-10 nm imprint lithography and applications”, Journal of Vacuum Science & Technology B, Vol.15, No.6, pp. 2897-2904, (1997)
[4] Michael D. Austin and Stephen Y. Chou, “Fabrication of 70 nm channel length polymer organic thin-film transistors using nanoimprint lithography”, Applied Physical. Letter, Vol. 81, No. 23, pp. 4431, (2002)
[5] M. Beck, M. Graczyk, I. Maximov, E.-L. Sarwe, T.G.I. Ling, M. Keil, L. Montelius, “Improving stamps for 10 nm level wafer scale nanoimprint lithography”, Microelectronic Engineering, Vol. 61, pp. 441, (2002)
[6] Matthew Colburn, Stephen C. Johnson, Michael D. Stewart, S. Damle, Todd C. Bailey, Bernard Choi, M. Wedlake, Timothy B. Michaelson, S. V. Sreenivasan, John G. Ekerdt, and C. Grant Willson, ” Step and flash imprint lithography: a new approach to high-resolution patterning”, Proceedings of SPIE, Vol. 3676, pp. 379, (1999)
[7] XD Huang, LR Bao, X Cheng, LJ Guo, SW Pang, AF Yee , “Reversal imprinting by transferring polymer from mold to substrate”, Journal of Vacuum Science & Technology B, Vol. 20, No. 6, pp. 2872-2876, (2002)
[8] XD Huang, LR Bao, X Cheng, LJ Guo, SW Pang, AF Yee , “Nanoimprinting over topography and multilayer three-dimensional printing”, Journal of Vacuum Science & Technology B, Vol. 20, No. 6, pp. 2881-2886, (2002)
[9] Kosuke Kuwabara, Masahiko Ogino, Shigehisa Motowaki, Akihiro Miyauchi, “Fluorescence measurements of nanopillars fabricated by high-aspect-ratio nanoprint technology”, Microelectronic Engineering, Vol. 73, pp. 752, (2004)
[10] F Perennes, B Marmiroli, M Matteucci1, M Tormen, L Vaccari and E Di Fabrizio, “Sharp beveled tip hollow microneedle arrays fabricated by LIGA and 3D soft lithography with polyvinyl alcohol”, Journal of Micromechanics and Microengineering, Vol. 16, pp. 473–479, (2006)
[11] P Kim, D H Kim, B Kim, S K Choi, S H Lee, A Khademhosseini, R Langer and K Y Suh, “Fabrication of nanostructures of polyethylene glycol for applications to protein adsorption and cell adhesion”, Nanotechnology, Vol. 16, No. 10, pp. 2420–2426, (2005)
[12] Sang Hoon Kim, Ki-Dong Lee, Ja-Yeon Kim, Min-Ki Kwon and Seong-Ju Park, “Fabrication of photonic crystal structures on light emitting diodes by nanoimprint lithography”, Nanotechnology, Vol. 18, No.5, (2007)
[13] Ulrike Schulz, “Review of modern techniques to generate antireflective properties on thermoplastic polymers”, Applied optics, Vol. 45, No. 7, pp. 1608, (2006)
[14] Chia-Jen Ting, Meng-Chi Huang, Hung-Yin Tsai, Chang-Pin Chou and Chien-Chung Fu, “Low cost fabrication of the large-area anti-reflection films from polymer by nanoimprint/hot-embossing technology”, Nanotechnology, Vol. 19, No. 20, pp. 2053, (2008)
[15] Zhong Lin Wang, and Jinhui Song, “Piezoelectric Nanogenerators Based on Zinc Oxide Nanowire Arrays”, Science, Vol. 312, No. 5771, pp. 242, (2008)
[16] H. GUCKEL, “High-aspect-ratio micromachining via deep X-ray lithography”, Proceedings of the IEEE, Vol. 86, No. 8, (1998)
[17] F. Marty, L. Rousseau, B. Saadany, B. Mercier, O. Français, Y. Mita and T. Bourouina, “Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures”, Microelectronics Journal, Vol. 36, No. 7, pp. 673, (2005)
[18] Y. Zhang, R. M. Lowe, E. Harvey, P. Hannaford and A. Endo, “High aspect-ratio micromachining of polymers with an ultrafast laser”, Applied Surface Science, Vol. 186, No. 1-4, pp. 345, (2002)
[19] H. Lorenz, M. Despont, P. Vettiger and P. Renaud, “Fabrication of photoplastic high-aspect ratio microparts and micromolds using SU-8 UV resist”, Microsystem Technologies, Vol. 4, No. 3, pp. 143, (1998)
[20] Seh-Won Ahn, Ki-Dong Lee, Jin-Sung Kim, Sang Hoon Kim, Joo-Do Park, Sarng-Hoon Lee and Phil-Won Yoon, “Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography”, Nanotechnology, Vol. 16, No. 9, pp. 1874, (2005)
[21] Matthew Colburn, A Grot, M Amistoso, BJ Choi, T Bailey, “Step and flash imprint lithography for sub-100-nm patterning”, Proceedings of SPIE, Vol. 3997, pp. 453, (2000)
[22] L.J. Heyderman, H. Schift, C. David, J. Gobrecht, T. Schweizer, “Flow behaviour of thin polymer films used for hot embossing lithography”, Microelectronic Engineering, Vol. 54, pp. 229, (2000)
[23] H Schift, L J Heyderman, M Auf der Maur and J Gobrecht, “Pattern formation in hot embossing of thin polymer films”, Nanotechnology, Vol. 12, No. 2, pp173, (2001)
[24] http://www.topas.com/
[25] D.W. van Krevelen, Properties of Polymers, Elsevier, Third edition, Amsterdam, (1990)
[26] S Landis, NChaix, CGourgon, C Perret and T Leveder, “Stamp design effect on 100 nm feature size for 8 inch NanoImprint lithography”, Nanotechnology, Vol. 17, No. 10, pp. 2701, (2006)
[27] Corinne PERRET, C´ecile GOURGON, Guillaume MICOUIN and Jean Pierre GROLIER, “Influence of Thermal Properties of Polymers on NanoImprint Lithography Performance”, Japanese Journal of Applied Physics, Vol. 41, pp. 4203, (2002)
[28] Yoshihiko Hirai, Satoshi Yoshida, and Nobuyuki Takagi, “Defect analysis in thermal nanoimprint lithography”, Journal of Vacuum Science & Technology B, Vol. 21, No. 6, pp. 2765, (2003)
[29] HM Pollock, D Maugis, M Barquins, “The force of adhesion between solid surfaces in contact”, Applied Physics Letter, Vol. 33, No. 9, pp. 798, (1978)
[30] M. Beck, M. Graczyk, I. Maximov, E.-L. Sarwe, T.G.I. Ling, M. Keil, L. Montelius, “Improving stamps for 10 nm level wafer scale nanoimprint lithography”, Microelectronic Engineering, Vol. 61, pp. 441, (2002)
[31] 李海華，李小麗，王慶康， “納米壓印技術中模板表面的氣相法抗粘連修飾”, 上海交通大學學報, Vol.41 No.10, (2007)
[32] Bin Liu, Yaning He, Yin Fan, Xiaogong Wang , “Fabricating Super-Hydrophobic Lotus-Leaf-Like Surfaces through Soft-Lithographic Imprinting”, Macromolecular Rapid Communications, Vol. 27, No. 21, pp. 1859, (2006)
[33] G Xie, G Zhang, F Lin, J Zhang, Z Liu, S Mu, “The fabrication of subwavelength anti-reflective nanostructures using a bio-template”, Nanotechnology, Vol. 19, No. 9, pp. 9056, (2008)
[34] Helmut Schift, Sunggook Park, Bokyung Jung, Choon-Gi Choi, Chul-Sik Kee, Sang-Pil Han, “Fabrication of polymer photonic crystals using nanoimprint lithography”, Nanotechnology, Vol. 16, No. 5, pp. 5261, (2005)
[35] Keun-Byoung Yoon and Jens Gobrecht Fatih Buyukserin, Mukti Aryal, Jinming Gao, and Wenchuang Hu, “Fabrication of Polymeric Nanorods Using Bilayer Nanoimprint Lithography”, Small, Vol. 5 , No. 14, pp. 1, (2009)
[36] MC Yang, J Shieh, CC Hsu, TC Cheng, “Well-Aligned Silicon Nanograss Fabricated by Hydrogen Plasma Dry Etching”, Electrochemical and Solid-State Letters, Vol. 8, No. 10, pp. C131, (2005)
[37] Ying Zhang, Chi-Wei Lo, J. Ashley Taylor, and Shu Yang, “Replica Molding of High-Aspect-Ratio Polymeric Nanopillar Arrays with High Fidelity”, Langmuir, Vol. 22, No. 20, pp. 8595, (2006)
[38] H.-C. Scheer, N. Bogdanski, M. Wissen, and S. Möllenbeck, “Impact of glass temperature for thermal nanoimprint”, Journal of Vacuum science & Technology, Vol. 25, No. 6, pp. 2392, (2007)
[39] Vera Trabadelo, Helmut Schift, Santos Merino, Sandro Bellini and Jens Gobrecht, “Measurement of demolding forces in full wafer thermal nanoimprint”, Microelectronic Engineering, Vol. 85, No. 5, pp. 907, (2008)
[40] Hyewon Kang, Jiyeon Lee, Joonhyung Park and Hong H Lee, “An improved method of preparing composite poly(dimethylsiloxane) moulds”, Nanotechnology, Vol. 17, No. 1, pp. 197, (2006)
[41] Alessandro Pozzato, Simone Dal Zilio, Giovanni Fois, Diego Vendramin, Giampaolo Mistura, Michele Belotti, Yong Chen, Marco Natali, “Superhydrophobic surfaces fabricated by nanoimprint lithography”, Microelectronic Engineering, Vol. 83, No. 4, pp. 884, (2006)
[42] S Shibuichi, T Onda, N Satoh, K Tsujii, “Super water-repellent surfaces resulting from fractal structure”, The Journal of Physical Chemistry, Vol. 100, No. 50, pp. 19512, (1996)
[43] C. G. Bernhard and W. H. Miller, “A corneal nipple pattern in insect compound eyes,” Acta Physiologica Scandinavica, Vol. 56, pp. 385, (1962)
[44] H Kikuta, H Toyota, W Yu, “Optical elements with subwavelength structured surfaces”, Optical Review, Vol. 10, No. 2, pp. 63, (2003)
[45] Byeong-Ju Bae, Sung-Hoon Hong, Eun-Ju Hong, Heon Lee, and Gun-young Jung, “Fabrication of Moth-Eye Structure on Glass by Ultraviolet Imprinting Process with Polymer Template”, Japanese Journal of Applied Physics, Vol. 48, No. 1, pp. 010207, (2009)
[46] Hanna-Kaisa Koponen, Inka Saarikoski, Tuulia Korhonen, Marjo Paakko, Risto Kuisma, Tuula T. Pakkanen, Mika Suvanto, Tapani A. Pakkanen, “Modification of cycloolefin copolymer and poly(vinyl chloride) surfaces by superimposition of nano- and microstructures”, Applied Surface Science, Vol. 253, pp. 5208, (2007)
[47] “表面微细结构制备超疏水表面”, 科學通報上海, 第49卷, 第17期, (2004)
[48] W.-H. Juan and S. W. Pang, “High-Aspect-Ratio Si Vertical Micromirror Arrays for Optical Switching”, Journal of Microelectromechanical Systems, Vol. 7, No. 2, pp. 207, (1998)
[49] Helmut Schift, “Nanoimprint lithography: An old story in modern times? A review”, Journal of Vacuum Science & Technology B, Vol. 26, No. 2, pp. 458, (2008)
[50] Aranzazu del Campo, and Eduard Arz, “Fabrication Approaches for Generating Complex Micro- and Nanopatterns on Polymeric Surfaces”, Chemical Reviews, Vol. 108, No. 3, pp. 911, (2008)
[51] Pere Roca-Cusachs, Felix Rico, Elena Martı´nez, Jordi Toset, Ramon Farre, and Daniel Navajas, “Stability of Microfabricated High Aspect Ratio Structures in Poly(dimethylsiloxane)”, Langmuir, Vol. 21, No. 12, pp. 5542, (2005)
[52] Lin Feng, Yanan Zhang, Jinming Xi, Ying Zhu, N Wang, Fan Xia, and Lei Jiang, “ Petal Effect: A Superhydrophobic State with High Adhesive Force“, Langmuir, Vol. 24, No. 8, pp. 4114, (2008)