研究生: |
許克強 Hsu, Ko-Chiang |
---|---|
論文名稱: |
噴塗熱裂解法製備銦鎵鋅氧化物薄膜之研究 The Growth of Indium-Gallium-Zinc Oxide Thin Film by Spray Pyrolysis Process |
指導教授: |
陳福榮
Chen, Fu-Rong |
口試委員: |
陳福榮
Fu-Rong Chen 林澤勝 Tzer-Shen Lin 孫文檠 Wen-Ching Sun |
學位類別: |
碩士 Master |
系所名稱: |
原子科學院 - 工程與系統科學系 Department of Engineering and System Science |
論文出版年: | 2014 |
畢業學年度: | 103 |
語文別: | 中文 |
論文頁數: | 78 |
中文關鍵詞: | 噴塗熱裂解法 、非晶IGZO薄膜 、前驅物 |
外文關鍵詞: | Spray pyrolysis process, Amorphous IGZO thin films, Precursors |
相關次數: | 點閱:2 下載:0 |
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摘要
本研究以噴塗熱裂解法(Spray Pyrolysis Method)來製備非晶氧化銦鎵鋅(In-Ga-Zn-O, IGZO)氧化物薄膜,此鍍膜技術設備簡單,可在非真空環境下沉積薄膜。不過非真空環境之下薄膜成分控制穩定相當困難,特別是在製備多元金屬氧化物混合薄膜。本研究就薄膜成分穩定做探討,主要分兩部分。首先藉由鍍膜之前前驅物金屬鹽類的選擇、前驅物溶液pH值做研究,探討IGZO噴塗熱裂解法中前驅物裂解成膜的機制。另一部分透過對IGZO薄膜做特性分析,以XRD繞射圖驗證其為非晶態,XPS確認化學鍵結與元素成分,進一步驗證以噴霧熱裂解法製備IGZO薄膜符合要求。最後透過各元素各自成膜能力不同做探討,從活化能和各自元素鍍率的不同切入,並將結果推想到IGZO混合薄膜上,解釋混合薄膜中各元素含量不均原因。
本研究從前驅物的特性,前驅物溶液中解離反應,製程時載氣、基板溫度對鍍率的改善,前驅物濃度對成膜後元素含量的影響等實驗時會碰到的參數作探討。期望做為未來欲以噴塗熱裂解法鍍多元混合薄膜時選擇適當前驅物和設計鍍膜參數的參考。
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