研究生: |
李才郎 Lee, Tsai-Lung |
---|---|
論文名稱: |
中空陰極式電漿源之研究 Study of a Hollow Cathode Plasma Source |
指導教授: |
寇崇善
Kou, Chwung-Shan |
口試委員: |
寇崇善
周賢鎧 劉偉強 |
學位類別: |
碩士 Master |
系所名稱: |
理學院 - 物理學系 Department of Physics |
論文出版年: | 2012 |
畢業學年度: | 100 |
語文別: | 中文 |
論文頁數: | 40 |
中文關鍵詞: | 中空陰極 |
相關次數: | 點閱:1 下載:0 |
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碳汙染會影響電子顯微鏡的解析度,為此本論文建立中空陰極式電漿源系統,希望將來能應用於電子顯微鏡的清潔。實驗內容包括以Langmuir Probe觀察電漿特性如電漿密度及電子溫度;觀察氧氣、氫氣、空氣電漿在各種環境下的OES光譜;觀察PVC受Downstream電漿處理的水滴角變化,與Langmuir Probe量測和OES量測做比較。研究結果我們可以低頻、低功率方式點起中空陰極式電漿,並且證實電漿可與碳氫物進行反應。實驗結果顯示在40 mTorr、60 W即可點起電漿,密度可達1011 cm-3,距離電漿源18 cm處密度仍有1010 cm-3。PVC受電漿處理後水滴角下降,在距離電極18 cm處最多可從75°降至11°,在28 cm處最多可降至22°。
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