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研究生: 王清輝
Wang, Chin-Hui
論文名稱: 氧化鋅氧化錫系非晶透明導電薄膜
指導教授: 吳振名
Wu, Jenn-Ming
口試委員:
學位類別: 碩士
Master
系所名稱: 工學院 - 材料科學工程學系
Materials Science and Engineering
論文出版年: 2009
畢業學年度: 97
語文別: 中文
論文頁數: 98
中文關鍵詞: 透明導電氧化鋅氧化錫
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  • 近年來隨著光電產業發展,透明導電氧化物薄膜被廣泛的研究及使用,目前多使用的材料就是ITO,但由於氧化銦的短缺以及平面顯示器與太陽能電池產業的大量需求,急需發展出替代之材料。此外,由於OLED與大面積平面顯示器的需求下,非晶(amorphous)的TCO也逐漸受到重視,但基本上使用的材料還是ITO及其化合物;故在a-TCO的部分也急需發展出替代之材料。
    在許多被研究的材料中,ZTO是十分有希望的候選材料,首先是因為ZnO與SnO2較In2O3便宜許多;其次是ZTO薄膜同時擁有ZnO在還原氣氛下十分穩定與SnO2在氧化氣氛下穩定和抗酸耐鹼的特性,這與ITO所缺乏的。而且這兩種材料沒有毒性在地球上純量豐富。但目前ZTO薄膜最大的問題就是導電性質較差,與含有In2O3的材料相比電阻率多了1-2數量級,因此有研究想藉由常用的摻雜方式來改善,但成效不彰且機制尚不明瞭。故本實驗想藉由氫離子與鈮離子的摻雜,來達到降低電阻率的目的。
    本實驗採用射頻磁控濺鍍法(rf-sputtering)在玻璃基板鍍上a-ZTO薄膜,並藉由兩階段的退火熱處理使電阻率下降至約8 x10-3 Ωcm。並且試著以氫摻雜與鈮摻雜的方式來提升導電性質:摻雜氫的方式是利用在濺鍍氣體中加入氫氣,然而目前尚無法成功使薄膜電阻下降,且因為加入氫氣所薄膜品質較差,導電性質反而來的差;但仍可利用兩階段退火使電阻率下降到約8x10-3 Ωcm,穿透率也在85%以上。另外也以嘗試鈮摻雜,但摻雜鈮的效果反而使電阻率上升至約5 x10-2 Ωcm,與其他研究的結果類似。未來也可嘗試不同的摻雜,希望可以使得導電性質再提升,使得ZTO有機會成為新一代的a-TCO薄膜。


    摘要 II 表目錄 V 圖目錄 VI Chapter 1 前言 1 1-1 透明導電薄膜簡介 1 1-2 實驗動機 2 Chapter 2 文獻回顧 4 2-1 transparent conducting oxide, TCO 4 2-1-1 TCO的導電機制 5 2-1-2 TCO的光學性質 6 2-1-3 TCO的種類 7 2-1-4 TCO的製備18 8 2-2 amorphous TCO (a-TCO) 9 2-2-1 Ionic amorphous oxide semiconductor, IAOS 10 2-2-2 a-TCO的種類 11 2-3 ZnO-SnO2, ZTO thin film 12 2-3-1 ZTO的結構與性質 12 2-3-2 ZTO thin film的研究成果 12 Chapter 3 實驗方法與步驟 19 3-1 製作靶材 19 3-2 製備基板 20 3-3 鍍製薄膜 20 3-3-1 鍍製薄膜 20 3-3-2 退火處理 20 3-4 材料分析與性質量測 21 3-4-1 X-ray繞射儀 (XRD) 21 3-4-2 掃描式電子顯微鏡 (SEM) 21 3-4-3 原子力顯微鏡 (AFM) 21 3-4-4 霍爾效應量測系統 (Hall effect measurement system) 21 3-4-5 紫外光-可見光光譜儀 (UV-vis Spectrophotometer) 22 3-4-6化學分析電子能譜儀 (Electron Spectroscopy Chemical Analysis, ESCA) 22 Chapter 4 實驗結果與討論 26 4-1 評估主要製程參數 26 4-1-1 工作壓力之影響 27 4-1-2 射頻功率之影響 29 4-1-3 總結 31 4-1-4 後續熱處理 31 4-2 鍍製各種比例的氧化鋅錫薄膜 31 4-2-1 初鍍膜 32 4-2-2 還原氣氛退火 33 4-2-3 不同的退火熱處理 35 4-2-4 結論 40 Chapter 5 摻雜的a-ZTO薄膜 72 5-1 氫摻雜(H-doped)的a-ZTO薄膜 72 5-1-1 濺鍍參數的影響 72 5-1-2 退火熱處理 76 5-2 鈮摻雜(Nb-doped)的a-ZTO薄膜 78 5-2-1 薄膜厚度 78 5-2-2 成分分析 79 5-2-3 結構分析與表面分析 79 5-2-4 電性分析 79 5-2-5 光學性質 80 5-2-6 結論 80 Chapter 6 結論 94 Reference 95

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