近年來，面板業愈來愈蓬勃發展，而光學膜如抗反射、抗靜電、增亮膜等的使用與研究也隨之大幅增加，本研究於已具有孔洞的高分子膜上，以浸沾方式塗佈ITO(Indium Tin Oxide)透明導電顆粒，以達到抗靜電的效果，同時降低反射率。文獻中製備ITO顆粒之方法以共沉澱和水熱法為主，本研究選擇以水熱法製備ITO顆粒。
　　我們使用三氧化銦與四氧化錫為先驅物，再藉由改變表面改質劑β-alanine之添加量、水熱反應溫度、反應時間及氨水添加量進行探討，發現添加β-alanine可使顆粒成長受到控制，但濃度增加至647.5mM後，產物由掺雜錫的In(OH)3轉為InOOH；當添加323.8mM β-alanine，反應時間縮短為3小時後，顆粒成長時間減少，正方晶形的In(OH)3顆粒尺寸可有效的縮小至17nm，但反應時間增加至48小時，In(OH)3脫水轉為形成InOOH；反應溫度由180 oC增加至200 oC時，反而使顆粒大小不均ㄧ，但平均尺寸明顯的增大了許多；較多的氨水參予反應時，產物顆粒約83nm，當減少氨水量時，產物為斜方晶形之InOOH。
水熱法產物經過鍛燒溫度及鍛燒時間的討論後，發現17nm之正方晶形In(OH)3以500 oC下鍛燒三小時，其粉末壓片之電阻值為2200Ω．cm，而聚集團(cluster)尺寸為224nm，此為最適合之鍛燒條件。以0.83wt% ITO奈米導電顆粒分散於水中，選擇以浸沾式塗佈法製備多功能光學膜，以浸沾拉速52cm/min塗佈三次製備出的光學膜效果最佳，穿透度可達86%，其電阻值為1.6×109Ω，可達到抗靜電的效果，又因塗佈奈米顆粒後，使得表面粗糙化，反射率降低至3.8%，達到抗眩之效用，故本實驗成功以浸沾式塗佈法製備抗反射、抗眩及抗靜電多功能光學膜。

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