鐵酸鉍、鐵鈰酸鉍及氧化鈰單一及複合薄膜之研究

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研究生：	蕭小鳳 Hsiao, Hsiao-Feng
論文名稱：	鐵酸鉍、鐵鈰酸鉍及氧化鈰單一及複合薄膜之研究
指導教授：	胡塵滌 Hu, Chen-Ti 呂正傑 Leu, Ching-Chich
口試委員:	呂正傑簡昭欣
學位類別：	碩士 Master
系所名稱：	工學院 - 材料科學工程學系 Materials Science and Engineering
論文出版年：	2011
畢業學年度：	99
語文別：	中文
論文頁數：	205
中文關鍵詞：	鐵酸鉍薄膜、溶膠溶液法、複鐵式、鐵電性、漏電流密度
外文關鍵詞：	BiFeO3 thin film, sol–gel solution, Multiferroic, Ferroelectric, leakage current density
相關次數：	點閱：4 下載：0
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本實驗使用溶膠凝膠法(Sol-gel method)，製備複鐵式鐵酸鉍薄膜(BiFeO3)。在當前BFO薄膜研究文獻中，報導其在室溫下具有較低的漏電阻抗性，使其在研究與應用方面皆遭受限制。因此在本篇論文探討摻雜稀土元素鈰Ce進入BFO薄膜，藉由具有四價及三價的鈰離子取代鉍離子來改善薄膜的漏電流問題；再將具有Ce摻雜的Bi1.05-xCexFeO3薄膜與BiFeO3薄膜作複合層結構，以及另一部分為加入一層氧化鈰的緩衝層在Pt底電極與薄膜之間，分別探討薄膜結晶結構與鐵電、鐵磁性質間的關係。
由實驗結果可得知，Ce的摻雜、複合層結構、氧化鈰緩衝層皆具有改善薄膜漏電流密度影響的效果，量測所得值約介於10-8至10-6 A/cm2之間，其中複合層結構具有減緩接近高電場時漏電急遽上升的現象；根據電場-電流密度圖形分析，薄膜漏電機制應為Space charge limited conduction的導電機制。在電滯曲線圖形上，夾心結構BCFO/BFO/BCFO(1/4/1)與BFO/BCFO(8/1) 550˚C退火試片呈現似飽和電滯曲線的形狀，並且BFO/BCFO(8/1) 550˚C 此組試片，在外加電場200kV/cm下所得2Pr值可達13.80μC/cm2，此較佳鐵電特性可能與較低漏電流有關。而加入緩衝層可使純BFO薄膜極化量微幅增加， 2Ec值下降。

第一章 緒論    5
1-1 前言    5
1-2 研究動機與方向    6
第二章 文獻回顧    8
2-1 鐵電薄膜之簡介 (Ferroelectric thin film)    8
2-1-1 鐵電薄膜之歷史演進[1]    8
2-1-2 鐵電材料之結構[2,3]    8
2-1-3 鐵電特性[6,7]    9
2-2介電性質簡介    12
2-2-1 極化現象與介電常數    12
2-2-2 極化機制    13
2-2-3 漏電流機制[14-16]    14
2-3磁性原理簡介[20-23]    17
2-3-1磁性的來源    17
2-3-2磁滯曲線    18
2-3-3居禮溫度(Curie temperature)    18
2-3-4尼爾溫度(Neel temperature)    19
2-3-5磁性的分類    19
2-4複鐵式性質(Multiferro properties)    22
2-4-1複鐵式薄膜之文獻回顧    24
2-4-2複鐵式材料(Multiferro materials)    26
2-5鉍酸鐵(BiFeO3)系統    28
2-5-1鉍酸鐵的結構與特性    28
2-5-2鉍酸鐵研究文獻回顧    31
2-5-2-1鉍酸鐵摻雜稀土元素的研究文獻    33
2-5-2-2鉍酸鐵複合層的研究文獻    36
2-6薄膜之製備[102]    38
2-6-1 溶膠—凝膠法(Sol-Gel)    39
2-6-2 配方溶液的配製    39
2-6-3 薄膜披覆製程    41
2-6-4 低溫焦化熱處理    42
2-6-5 高溫結晶與緻密化處理    43
第三章 實驗程序    60
3-1  基板的備製    60
3-1-1  擴散阻絕層及黏著層的製備    60
3-1-2  白金底電極的製備    61
3-2  BFO複鐵薄膜製備    62
3-2-1  BFO溶膠的製備    62
3-2-2  CeOx緩衝層溶膠的製備    64
3-2-3  BFO薄膜的鍍製及薄膜複合的製程    64
3-2-4  薄膜熱處理    65
3-3  鐵電薄膜性質之量測與分析    65
3-3-1  物性分析    65
3-3-2 電性量測    67
3-4 磁性分析    68
第四章 結果與討論    75
4-0  EDS 化學成分分析    75
4-1  XRD晶體結構分析    75
4-1-1  BFO、BCFO的XRD分析    76
4-1-2  BFO與BCFO複合堆疊薄膜的XRD分析    78
4-1-3  加入緩衝層BFO薄膜的XRD分析    79
4-1-4  薄膜X光繞射結晶優選方向與鐵電特性間之關係分析    80
4-2  表面顯微結構、粗糙度分析與SEM橫截面    81
4-2-1  BFO、BCFO之表面及橫截面形貌分析    81
4-2-2  BFO與BCFO複合層堆疊薄膜之表面及橫截面形貌分析    83
4-2-3  加入緩衝層BFO薄膜之表面及橫截面形貌分析    85
4-2-4  薄膜粗糙度的分析    86
4-3 電流密度量測    87
4-3-1  BFO、BCFO之電流密度量測    87
4-3-2  BFO與BCFO複合堆疊薄膜之電流密度量測    89
4-3-3  加入緩衝層BFO薄膜之電流密度量測    90
4-4 介電特性量測    91
4-4-1  BFO、BCFO之介電特性    91
4-4-2  BFO與BCFO複合堆疊薄膜之介電特性    92
4-4-3  加入緩衝層BFO薄膜之介電特性    94
4-5  鐵電特性之量測    94
4-5-1  BFO、BCFO之鐵電特性量測    94
4-5-2  BFO與BCFO複合層薄膜之鐵電特性量測    95
4-5-3  加入緩衝層BFO薄膜之鐵電特性量測    97
4-6  SQUID磁性分析    97
4-6-1  Pt/TiOx/SiO2/Si基板之磁性分析    98
4-6-2  BFO、BCFO之磁性分析    98
4-6-3  BFO與BCFO複合堆疊薄膜之磁性分析    99
4-6-4  加入緩衝層BFO薄膜之磁性分析    99
第五章 結論    191

                                

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